F
Fred E. Stanke
Researcher at Tokyo Electron
Publications - 19
Citations - 817
Fred E. Stanke is an academic researcher from Tokyo Electron. The author has contributed to research in topics: Metrology & Spectrometer. The author has an hindex of 10, co-authored 19 publications receiving 815 citations.
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Patent
Overlay alignment metrology using diffraction gratings
TL;DR: In this article, an alignment accuracy between two or more patterned layers is measured using a metrology target comprising substantially overlapping diffraction gratings formed in a test area of the layers being tested.
Patent
Method of measuring meso-scale structures on wafers
TL;DR: In this paper, the authors proposed a method of measuring at least one parameter associated with a portion of a sample having formed thereon one or more structures with at least two zones each having an associated zone reflectance property.
Patent
Database interpolation method for optical measurement of diffractive microstructures
TL;DR: In this article, a database interpolation method is used to rapidly calculate a predicted optical response characteristic of a diffractive microstructure as part of a real-time optical measurement process.
Patent
Optical critical dimension metrology system integrated into semiconductor wafer process tool
Michael Weber-Grabau,Edric H. Tong,Adam E. Norton,Fred E. Stanke,James M. Cahill,Douglas E. Ruth +5 more
TL;DR: In this article, a wafer measurement station integrated within a process tool has a scatterometry instrument for measuring patterned features on wafers, and data processing uses a scattering model to analyze the optical signature of the collected light.
Patent
Polarimetric scatterometry methods for critical dimension measurements of periodic structures
TL;DR: An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample as discussed by the authors.