G
Gong Chen
Researcher at Motorola
Publications - 5
Citations - 11
Gong Chen is an academic researcher from Motorola. The author has contributed to research in topics: Signal & Stepper. The author has an hindex of 2, co-authored 5 publications receiving 11 citations.
Papers
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Patent
Method for alignment in photolithographic processes
TL;DR: In this article, an optical image of the target is captured, and components (33) of the image lacking the characteristic spatial period (P) are filtered out, and the filtered image is integrated in the direction of the characteristic period, thereby creating an alignment signal (40).
Journal ArticleDOI
Linear-Fresnel-Zone-Plate-Based Two-State Alignment Method for Sub-0.25 µm X-Ray Lithography System
TL;DR: In this paper, a linear Fresnel zone plate (LFZP) was used as a mask alignment mark and an array of dots as a wafer alignment mark, and the alignment error signal extraction was based on a two-state modulation of the incident light.
Journal ArticleDOI
Performance of the Modified Suss XRS 200 / 2M X-Ray Stepper at CXrL
Michael T. Reilly,Q. Leonard,G. M. Wells,C. Capasso,Paul A. Anderson,James Taylor,Whit G. Waldo,Kuniaki Yamazaki,Gong Chen,Klaus Simon,Franco Cerrina +10 more
TL;DR: An XRS 200 model 2M X-ray stepper has been installed at the Center for Xray Lithography (CXrL) as mentioned in this paper, and the performance of the stepper gives with respect to the dose control and the mask/wafer alignment.