G
Guang-Jye Shiau
Researcher at Applied Materials
Publications - 2
Citations - 159
Guang-Jye Shiau is an academic researcher from Applied Materials. The author has contributed to research in topics: Layer (electronics) & Tungsten. The author has an hindex of 2, co-authored 2 publications receiving 159 citations.
Papers
More filters
Patent
Method for anisotropically etching tungsten using SF6, CHF3, and N2
TL;DR: In this paper, a method for etching a tungsten containing layer 25 on a substrate 10 substantially anisotropic, with good etching selectivity, and without forming excessive passivating deposits on the etched features is presented.
Patent
Method for anisotropic etching of tungsten by using sulfur hexafluoride, trifluoromethane and nitrogen
TL;DR: In this paper, a process gas which contains sulfur hexafluoride, trifluoromethane and nitrogen is introduced into a plasma zone in which a substrate is arranged, a plasma is formed from the process gas and a tungsten content layer on the substrate is etched.