PROBLEM TO BE SOLVED: To provide a method of using a variable shaped beam (VSB) for forming an intended pattern on a surface which is advantageous in reducing time and costs in a charged particle beam drawing system.SOLUTION: A cluster of a plurality of VSB shots deviates from an intended pattern. VSB shots are made to be mutually superposable, and the dose of shots is changeable. A similar method is applied to optical proximity effect correction, fracturing, mask data preparation and proximity effect (OPC) correction. To create glyphs, a pattern to be formed on a surface by one VSB shot or group of VSB shots is calculated preliminarily. An optimization technique can be used to minimize the number of shots. The method is used in e.g. a process of producing integrated circuits by optical lithography using a reticle or a process of producing integrated circuits by direct drawing.

グラッサー，ランス

Papers

Method for optical proximity effect correction, design and production of reticle using variable shaped beam lithography, design and production