Showing papers by "Helmut Riedl published in 2022"

Anisotropic super-hardness of hexagonal WB2±z thin films

Abstract: Transition metal diboride-based thin films are promising candidates to replace state-of-the-art protective and functional coating materials due to their unique properties. Here, we focus on hexagonal WB 2-z , showing that the AlB 2 structure is stabilized by B vacancies exhibiting its energetic minima at sub-stoichiometric WB 1.5 . Nanoindentation reveals super-hardness of 0001 oriented α-WB 2-z coatings, linearly decreasing by more than 15 GPa with predominant 10 1 orientation. This anisotropy is attributed to differences in the generalized stacking fault energy of basal and pyramidal slip systems, highlighting the feasibility of tuning mechanical properties by crystallographic orientation relations. GRAPHICAL ABSTRACT IMPACT STATEMENT First report of an anisotropic elastoplastic behaviour in super-hard PVD AlB 2 structured WB 2-z . Theoretical and experimental verification of thermodynamically most stable sub-stoichiometric α-WB 2-z coatings by structural and mechanical analysis.

Influence of Si on the oxidation behavior of TM-Si-B2±z coatings (TM = Ti, Cr, Hf, Ta, W)

Abstract: The concept of Si alloyed transition metal (TM) diborides – well explored for bulk ceramics – is studied for five different physical vapor deposited TM-Si-B2±z (TM = Ti, Cr, Hf, Ta, W) coatings, focusing on the oxidation behavior up to 1200 °C. In their as deposited state, all coatings exhibit single phased AlB2 prototype structures, whereby the addition of Si results in dense, refined morphologies with no additional phases visible in the X-ray diffractograms. With already low amounts of Si, the slope of the mass increase during dynamic oxidation flattens, especially for Ti-Si-B2±z, Cr-Si-B2±z, and Hf-Si-B2±z. Above distinct Si contents, the formation of a steady state region exhibiting no further mass increase is promoted (starting at around 1000 to 1100 °C). Best results are obtained for Hf0.21Si0.18B0.61 and Cr0.26Si0.16B0.58 (both around 2.4 μm thick in the as deposited sate), revealing drastically retarded oxidation kinetics forming 400 nm thin oxide scales after 3 h at 1200 °C in ambient air (significantly lower compared to bulk ceramics). This highly protective oxidation mechanism is attributed to the formation of an amorphous Si rich oxide scale. The Si content needed to form these oxide scales largely differs between the TM-Si-B2±z coatings investigated, also diversifying the prevalent oxidation mechanism, especially for Cr-Si-B2±z.

Revisiting the origins of super-hardness in TiB2+z thin films – Impact of growth conditions and anisotropy

Abstract: Hexagonal transition metal diborides embody promising material systems for the purpose of protective thin films. Here, we focus on DC magnetron sputtered TiB2+z coating materials, comprehensively revisiting the impact of the stoichiometry on the structure-mechanical properties, from nearly stoichiometric TiB2.07 (B: 67 at. %) up to super-stoichiometric TiB4.42 (B: 82 at. %). The structural analysis confirmed the apparent correlation between the deposition pressure and the preferred {0001} orientation, which is essential to gain super-hardness (>40 GPa). In contrast, the hardness decreases for >10 GPa for 101¯1 and 1000 oriented thin films, underlining the pronounced anisotropy of TiB2+z. The broad stoichiometry variation revealed no predominant hardness effect based on a B-rich tissue phase. The excess B contributes to a decreasing column size correlating with a decreasing hardness of ≈ 7 GPa (B/Ti ratios >2.5) due to column boundary sliding events. Micro-cantilever bending experiments proved a declining fracture toughness from 3.02 ± 0.13 MPa√m for TiB2.43 to 2.51 ± 0.14 MPa√m for TiB4.42 to be column size dependent.

Non-reactive HiPIMS deposition of NbCx thin films: Effect of the target power density on structure-mechanical properties

Abstract: The exceptional mechanical properties of transition metal carbide coatings are known to be governed by the carbon content and its morphological distribution. Here, we verify the influence of the target peak power density on the chemical composition, microstructure, and mechanical properties of NbCx coatings grown by non-reactive high-power impulse magnetron sputtering (HiPIMS). By tuning the pulse parameters, the power density can be increased from 0.11 to 1.48 kW/cm2 leading to a decrease in the C/Nb ratio from 1.52 to 0.99 within the films – proven by combined elastic backscattering and time-of-flight elastic recoil detection analysis. This decrease in the C/Nb ratio is accompanied by microstructural changes from nanocomposite morphologies with an average grain size of 6.6 ± 2.5 nm at 0.13 kW/cm2 into more columnar structures with an average column width of 65.2 ± 18.7 nm at 1.48 kW/cm2. Independent from the C/Nb ratio, all films exhibit a single face-centered cubic structure. The mechanical properties correlate with the enhanced growth behavior dominated by ions at higher peak power densities and the varied C/Nb ratios. A maximum in hardness and fracture toughness of H = 38.7 ± 3.6 GPa and KIc = 2.78 ± 0.13 MPa∙m1/2 (at 3.2 GPa residual compressive stress), is obtained for the nearly stoichiometric NbC coating exhibiting C/Nb ratio of 1.06.

Quantitative Depth Profiling Using Online-Laser Ablation of Solid Samples in Liquid (LASIL) to Investigate the Oxidation Behavior of Transition Metal Borides

Abstract: The increased demand for sustainability requires, among others, the development of new materials with enhanced corrosion resistance. Transition metal diborides are exceptional candidates, as they exhibit fascinating mechanical and thermal properties. However, at elevated temperatures and oxidizing atmospheres, their use is limited due to the fact of their inadequate oxidation resistance. Recently, it was found that chromium diboride doped with silicon can overcome this limitation. Further improvement of this protective coating requires detailed knowledge regarding the composition of the forming oxide layer and the change in the composition of the remaining thin film. In this work, an analytical method for the quantitative measurement of depth profiles without using matrix-matched reference materials was developed. Using this approach, based on the recently introduced online-LASIL technique, it was possible to achieve a depth resolution of 240 nm. A further decrease in the ablation rate is possible but demands a more sensitive detection of silicon. Two chromium diboride samples with different Si contents suffering an oxidation treatment were used to demonstrate the capabilities of this technique. The concentration profiles resembled the pathway of the formed oxidation layers as monitored with transmission electron microscopy. The stoichiometry of the oxidation layers differed strongly between the samples, suggesting different processes were taking place. The validity of the LASIL results was cross-checked with several other analytical techniques.