A method of producing a Fresnel zone plate (15) comprising: making available a substrate (1, 4, 7) which is rotationally symmetrical with respect to its center axis (1 a, 4 a, 7 a); applying layers (2 a-d; 5 a-d; 8 a-d ; 11) following in succession by means of an atomic layer deposition (ALD) method to faces (1 b-c; 4 b-c; 7 b-c) of the substrate (1, 4, 7) without rotation of the substrate (1, 4, 7) in order to form a coated substrate, and severing (3 a, b; 6 a, b; 9 a, b) at least one slice (13) from the coated substrate (1, 4, 7), by the coated substrate (1, 4, 7) being divided at least once at a right angle to the center axis (1 a, 4 a, 7 a).

Method and apparatus for producing a Fresnel zone plate

The invention concerns to a method of producing a Fresnel Zone Plate (1 ) for applications in high energy radiation including the following steps: supply of a substrate (2) transparent for high energy radiation, deposition of a layer (3) of a metal, a metal alloy or a metal compound on a planar surface (4) of the substrate (2), calculating a three dimensional geometrical profile (5) with a mathematical model, setting up a dosage profile (6) for an ion beam of the ion beam lithography inverse to the calculated three dimensional geometrical profile (5) and milling a three dimensional geometrical profile (5) with concentric zones into the layer (3) with ion beam lithography by means of focused ion beam.

Method of producing a Fresnel Zone Plate for applications in high energy radiation

The invention relates to a high resolution full material Fresnel Zone Plate array comprising a plurality of full material Fresnel Zone Plates on a common carrier, a method for producing a full material Fresnel Zone Plate precursor array by providing a common carrier comprising a plurality of micro-pillars and deposition of alternating layers of at least two different materials onto at least some of the micro-pillars and an apparatus for producing high resolution full material Fresnel Zone Plate (FZP) arrays The apparatus for producing a full material Fresnel Zone Plate arrays, comprises a first device for providing a plurality of micro-pillars in a common carrier, a deposition device which applies alternating layers of at least two different materials onto at least some of the micro-pillars arranged on the common carrier and a slicing device which slices a full material Fresnel Zone Plate out of a pillar

High resolution full material fresnel zone plate array and process for its fabrication

Process for producing a Fresnel zone plate (13), comprising: - the provision of a substrate (1, 4, 7) which is rotationally symmetrical with respect to the central axis (1a, 4a, 7a) thereof; - the application of successive layers (2a - d; 5a - d; 8a - d; 11) by means of an atomic layer deposition (ALD) process to areas (1b - c; 4b - c; 7b - c) of the substrate (1, 4, 7) without rotation of the substrate (1, 4, 7) in order to form a coated substrate; and - the separation (3a, b; 6a, b; 9a, b) of at least one disc (13) from the coated substrate (1, 4, 7) by dividing the coated substrate (1, 4, 7) at least once perpendicular to the central axis (1a, 4a, 7a).

Process and apparatus for producing a fresnel zone plate

This invention relates to a method of forming multiple bilayers on a substra te using an atomic layer deposition process. The reflecting layer of the bilaye r pair can be a high electron density metal and the spacing layer of the bilay er pair can be a low electron density material. Because atomic layer deposition can deposit atomic layer controlled and conformal films, multiple bilayers c an be deposited on the internal surfaces of monocapillary tubes. By applying a graded multiple bilayer, much higher reflectivity and higher flux optical elements can be obtained than those based on total external reflection. Deposition of a graded multiple bilayer on an elliptic or parabolic tapered tube leads to focused or collimated output from a point source input. Variou s atomic, layer deposition techniques are described to produce the graded multiple bilayer high quality X-ray focusing devices, especially for "hard" X- ~rays.

Henderson Stephen John

Papers

High reflectivity and high flux x-ray optic element and method of making same using atomic layer deposition techniques