A data management system or “DMS” provides a wide range of data services to data sources associated with a set of application host servers. The data management system typically comprises one or more regions, with each region having one or more clusters. A given cluster has one or more nodes that share storage. To facilitate the data service, a host driver embedded in an application server connects an application and its data to a cluster. The host driver provides a method and apparatus for capturing real-time data transactions in the form of an event journal that is provided to the data management system. The driver functions to translate traditional file/database/block I/O into a continuous, application-aware, output data stream. Using the streams generated in this manner, the DMS offers a wide range of data services that include, by way of example only: data protection (and recovery), disaster recovery (data distribution and data replication), data copy, and data query and access.

System for moving real-time data events across a plurality of devices in a network for simultaneous data protection, replication, and access services

A data management system or 'DMS' provides a wide range of data services to data sources (520) associated with a set of application host servers. The data management system typically comprises one or more regions, with each region having one or more clusters. A given cluster has one or more nodes that share storage. To facilitate the data service, a host driver (510) embedded in an application server connects an application (514) and its data to a cluster. The host driver provides a method and apparatus for capturing real-time data modifications and application state notifications and, in response, generating data transactions in the form of an event journal that is provided to the data management system. The driver functions to translate traditional file/database/block I/O into a continuous, application-aware, output data stream. Using the streams generated in this manner, the DMS offers a wide range of data services that include, by way of example only: data protection (and recovery), and disaster recovery (data distribution and data replication).

Method and system for real-time event journaling to provide enterprise data services

A data management system (DMS) includes a continuous real-time object store that captures all real-time activities, with associated object metadata information. The DMS is capable of reintroducing any point-in-time view of data ranging from a granular object to an entire file system. A set of algorithms (for creation of a file or directory, modification of a file or directory, deletion of a file or directory, and relocation/renaming of a file or directory) are used to generate and maintain a file system history in the DMS and to ensure that a latest version of a directory always refers to a latest version of its children until the directory changed. Any point-in-time recovery is implemented using the file system history in one of various ways to provide strong individual file integrity, exact point-in-time crash consistency, and/or recovery of last version of all files in the file system.

Recovering a file system to any point-in-time in the past with guaranteed structure, content consistency and integrity

An inspection method and apparatus includes control of an acceleration voltage of an electron beam, irradiation of the electron beam to an object to be inspected mounted on a stage which is continuously moving at least in one direction, and detection of at least one of secondary electrons and reflected electrons emanated from the object in response to the irradiation An image of the object is obtained from the detected electron by using positional information of the stage and inspection or measurement of the object is conducted using an obtained image In the detection, an electric field in the vicinity of the object mounted on the stage is controlled so that at least one of the secondary electrons and the reflected electrons emanated from the object in response to the irradiation of the electron beam are decelerated

Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same

A data management method wherein a real-time history of a database system is stored as a logical representation and the logical representation is then used for any point-in-time recovery of the database system. More specifically, a method for capturing transaction data, binary data changes, metadata, and events, and for tracking a real-time history of a database system according to the events. The method enables tracking and storing of consistent checkpoint images of the database system, and also enables tracking of transaction activities between checkpoints. The database system may be recovered to any consistent checkpoint or to any point between two checkpoints.

Recovering a database to any point-in-time in the past with guaranteed data consistency

A method of exposing a wafer to a charged-particle beam by directing to the wafer the charged-particle beam deflected by a deflector includes the steps of arranging a plurality of first marks at different heights, focusing the charged-particle beam on each of the first marks by using a focus coil provided above the deflector, obtaining a focus distance for each of the first marks, obtaining deflection-efficiency-correction coefficients for each of the first marks, and using linear functions of the focus distance for approximating the deflection-efficiency-correction coefficients to obtain the deflection-efficiency-correction coefficients for an arbitrary value of the focus distance. A device for carrying out the method is also set forth.

Charged-particle-beam exposure device and charged-particle-beam exposure method

To improve the throughput of an exposure system, the setting time during a step change in the output of an amplifier is reduced by switching resistance between the amplifier and a deflector. A glitch waveform generated during a step change in the output of a D/A converter at the preceding stage of the amplifier is anticipated and is cancelled out with a correction waveform. After the output of the D/A converter has settled, this output is sample-held and the step change is interpolated with a smoothing circuit. The deflection area is increased by positioning an electrostatic deflector offset around the optical axis relative to another electrostatic deflector, and the response speed of the main deflection is improved by adding auxiliary deflection coils of one or two turns. The alignment time is reduced by combining the coordinate conversion in the wafer area and in the chip area. In order to correct the astigmatism of the electromagnetic lens, two stages of coils are provided and an electric current corresponding to the quantity of deflection is supplied to the coils.

Method of and system for charged particle beam exposure

A device exposing a wafer to charged-particle beams in an exposure process generates a plurality of micro beams and controls deflection of each of the micro beams, relative to whether or not the micro beams reach the wafer, in accordance with control data. A data processing unit inserts data-position-adjustment data into the control data for each exposure. A first data-storage unit stores the control data, inserted with the data-position-adjustment data, and outputs the control data at a time of the exposure process. Storage positions of the control data in the first data-storage unit are adjusted by the data-position-adjustment data so that the control data can be continuously read from the first data-storage unit for maintaining a continuous exposure process.

Charged-particle-beam exposure device and method capable of high-speed data reading

A D/A converter converting a digital signal having n bits (n is an integer) into an analog signal includes constant-current output circuits, provided for the n bits of the digital signal, for selectively generating n constant currents on the basis of the n bits of the digital signals. The n constant currents have mutually different current values with respect to the n bits of the digital signal. The constant-current output circuits have resistance elements respectively provided for the n bits of the digital signal. The resistance elements define the mutually different current values. The D/A converter also includes an output circuit for adding the n constant currents to each other and for outputting the analog signal based on an addition result, and a temperature-dependent voltage generating part for generating a temperature-dependent voltage which changes as a temperature around the D/A converter changes. Further, the D/A converter includes a current compensation part for generating a compensation voltage related to at least one of the resistance elements from the temperature-dependent voltage and for applying the compensation voltage to the one of the resistance elements. The compensation voltage compensates for a temperature-dependent variation in a characteristic of the one of the resistance elements.

Digital-to-analog converter having a circuit for compensating for variation in output dependent on temperature change

A method for providing charged particle beam exposure onto an object having a plurality of chip areas with a plurality of aligning marks formed in correspondence to each of said chip areas. A charged particle beam is irradiated upon an object mounted on a mobile step based upon positions of the aligning marks. Actual positions of the alignment marks are detected and compared to the design positions of the alignment marks to determine approximate relationships which are used to calculate an actual position to perform exposure.

Method of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposure

Hidefumi Yabara

Papers

Charged-particle-beam exposure device and charged-particle-beam exposure method

Method of and system for charged particle beam exposure

Charged-particle-beam exposure device and method capable of high-speed data reading

Digital-to-analog converter having a circuit for compensating for variation in output dependent on temperature change

Method of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposure