Showing papers by "Hidehiro Watanabe published in 2006"
04 May 2006
TL;DR: In this article, the performance of electron beam reticle writer EBM-5000 (NFT) was examined with higher current density, and the performance with that operating condition was good enough to produce photomasks for 65nm node devices.
Abstract: The performance of electron beam reticle writer EBM-5000(NFT) was examined with higher
current density. The current density was raised up to 70A/cm 2 against to its standard current density
50A/cm 2 , and sufficiently good results were obtained with that operating condition. We concluded
that the performance with that operating condition was good enough to produce photomasks for
65nm node devices.
1 citations