A process for removing undesired material from a chosen substrate by exposing the substrate simultaneously to ultraviolet radiation and a selected dense fluid, wherein the radiation produces a photochemical reaction that removes the undesired material from the substrate and the dense fluid enhances the removal of the undesired material. In an alternative embodiment, a reactive agent may additionally be used. The process may be used to remove contaminants from a substrate, etch a substrate surface, or destroy toxic organic material in industrial wastes.

Dense fluid photochemical process for liquid substrate treatment

A transportable ozone neutralization system (10) for neutralizing a chemical compound is provided. The neutralization system (10) includes an enclosure (12) for substantially containing a container, such as a chemical munition (28), within which the chemical compound to be neutralized is contained. The neutralization system (10) further includes a liquid phase neutralization system (62) and a vapor phase neutralization system (100) which utilize ozone manufactured from the air, to contact the liquid and vapor phase chemical compounds through a solvent. The system neutralizes the chemical compound by the action of ozone in breaking the chemical bonds with the compound.

Ozone methods for the destruction of chemical weapons

Aqueous solutions containing metal cations, that may include cations of both desired metal and impurity or secondary metal, are treated with an organic liquid extractant suitable for the extraction of cations of the desired metal, cations of at least one secondary metal being co-extracted After phase disengagement, the loaded organic phase containing cations of either a desired metal or desired metal together with at least one secondary metal is contacted with a solid metal or solid metal alloy capable of reducing in the organic phase cations of either a desired metal or a secondary metal from a higher to a lower state of oxidation Depending on the extracted metal(s) and the added solid metal or alloy, cations of the at least one extracted metal are reduced to the lower state of oxidation and either are deposited (cemented) in the metallic state onto the solid metal or alloy, or are partially reduced in the organic phase to a lower oxidation state with the solid metal or alloy being oxidized in part The method of galvanic stripping is carried out at ambient pressures and at ambient or slightly elevated temperatures

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Method for stripping metals in solvent extraction

This invention is a process for controlling odor and septicity of sewage. A sulfur dioxide species is added to the sewage among with metal ion catalyst and the sewage is aerated. The effect of this treatment is to reduce the generation of hydrogen sulfide and the odor and corrosion associated with this compound and to reduce the need for aeration in the treatment of sewage. This results in substantial savings in aeration costs.

Control of odor and septicity of sewage

A combination of pollution control technologies are employed in the treatment of effluent from photographic processing The technologies employed are evaporation, oxidation by photolysis and catalyzed ozone, condensation, treatment by activated carbon and electrolysis The method includes the steps of filtering the liquid wastes, electrolytically treating the filtered liquid, evaporating the wastes to create steam and vapors, oxidizing the steam and vapors by photolysis and photolytic catalyzed ozone, and condensing the vapors and passing them through a column of activated carbon The carbon is regenerated by oxidizing the carbon sites with ozone

Method for pollution control in photographic processing

An improved process for the wet oxidation of malodorous gases obtained from sewage sludge drying operations is provided. Organic-enriched water having an oxygen demand of at least 5 mg per liter is utilized for the process.

Hubert J. Sharkey

Papers

Process for the destruction of noxious gases with ozone