H
Hyuk Lim
Researcher at Samsung
Publications - 6
Citations - 321
Hyuk Lim is an academic researcher from Samsung. The author has contributed to research in topics: Thin-film transistor & Ion beam deposition. The author has an hindex of 3, co-authored 6 publications receiving 321 citations.
Papers
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Patent
Thin film transistor and method of fabricating the same
TL;DR: In this paper, a thin film transistor with an offset or a lightly doped drain (LDD) structure by self alignment is presented. But this is not the case for all thin-film transistor architectures.
Patent
Poly-si thin film transistor and organic light-emitting display having the same
TL;DR: In this paper, a thin-film transistor comprises an Si-based channel having a nonlinear electron-moving path, a source and a drain disposed at both sides of the channel, a gate disposed above the channel and an insulator interposed between the channel between the source and the gate, and a substrate supporting the channel.
Patent
Method of preparing semiconductor film on a substrate
Jang Yeon Kwon,Hyuk Lim,Takashi Noguchi,Young-soo Park,Suk-pil Kim,Hans S. Cho,Ji-sim Jung,Kyung-Bae Park,Do-Young Kim +8 more
TL;DR: In this paper, a method of preparing a semiconductor film on a substrate is disclosed, which includes arranging an insulating substrate in a deposition chamber and depositing a semiconducting film onto the substrate using ion beam deposition.
Patent
Fabrication method of si film
Jang Yeon Kwon,Hyuk Lim,Takashi Noguchi,Young-soo Park,Suk-pil Kim,Chohans Se Young,Ji-sim Jung,Kyung-Bae Park,Do-Young Kim +8 more
TL;DR: In this paper, a method of preparing a semiconductor film on a substrate is disclosed, which includes arranging an insulating substrate in a deposition chamber and depositing a semiconducting film onto the substrate using ion beam deposition.
Patent
Method of fabricating a capacitor
Jang Yeon Kwon,Hyuk Lim,Takashi Noguchi,Young-soo Park,Suk-pil Kim,Chohans Se Young,Ji-sim Jung,Kyung-Bae Park,Do-Young Kim +8 more
TL;DR: In this article, a method of preparing a semiconductor film on a substrate is disclosed, which includes arranging an insulating substrate in a deposition chamber and depositing a semiconducting film onto the substrate using ion beam deposition.