Embodiments related to managing the process feed conditions for a semiconductor process module are provided. In one example, a gas channel plate for a semiconductor process module is provided. The example gas channel plate includes a heat exchange surface including a plurality of heat exchange structures separated from one another by intervening gaps. The example gas channel plate also includes a heat exchange fluid director plate support surface for supporting a heat exchange fluid director plate above the plurality of heat exchange structures so that at least a portion of the plurality of heat exchange structures are spaced from the heat exchange fluid director plate.

Process feed management for semiconductor substrate processing

The present invention relates to a process and system for depositing a thin film onto a substrate. One aspect of the invention is depositing a thin film metal oxide layer using atomic layer deposition (ALD).

Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species

A showerhead including a body having an opening, a first plate positioned within the opening and having a plurality of slots, a second plate positioned within the opening and having a plurality of slots, and wherein each of the first plate plurality of slots are concentrically aligned with the second plate plurality of slots.

Semiconductor reaction chamber showerhead

A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber.

Semiconductor processing reactor and components thereof

A gas inlet system for a wafer processing reactor includes a tubular gas manifold conduit adapted to be connected to a gas inlet port of the wafer processing reactor; and gas feeds including a first feed for feeding a first gas into the tubular gas manifold conduit and a second feed for feeding a second gas into the tubular gas manifold conduit. Each feed has two or more injection ports connected to the tubular gas manifold conduit at a first axial position of the tubular gas manifold conduit, and the injection ports of each of the gas feeds are evenly distributed along a circumference of the tubular gas manifold conduit at the first axial position.

Gas Supply Manifold And Method Of Supplying Gases To Chamber Using Same

An object of this invention is to provide a superior mass flow meter or the like that can flexibly cope with a change of a sample fluid such as a gas kind without requiring a special troublesome labor and that can measure a flow rate with high accuracy. The mass flow meter comprises a sensor section that detects a flow rate of a sample fluid flowing in a flow channel, a setting section that sets a flow rate characteristic function that is intrinsic to each fluid to determine a flow rate based on a flow rate detected value output by the sensor section and an instrumental error correction parameter that is independent from the flow rate characteristic function and common to multiple sample fluids to correct an instrumental error of each mass flow meter, and a flow rate calculating section that calculates a flow rate measurement value of the sample fluid by applying the flow rate characteristic function and the instrumental error correction parameter to the flow rate detected value.

Mass flow meter, mass flow controller, mass flow meter system and mass flow control system containing the mass flow meter and the mass flow controller

A mass flow controller with high accuracy flow rate output control is disclosed. In the mass flow controller, relation data that indicates a corresponding relation between a flow rate of a reference gas and a CF value of a sample gas is stored, a target flow rate is converted into a reference gas flow rate by the use of a predetermined CF value, a sample gas flow rate is calculated from the converted reference gas flow rate and a CF value corresponding to the reference gas flow rate, the sample gas flow rate is compared with the target flow rate, and the CF value that is used for conversion of the reference gas flow rate or calculation of the sample gas flow rate is updated by the use of the corresponding relation based on the error between the sample gas flow rate and the target flow rate.

Mass flow controller system

Mass flow meter, mass flow controller, and mass flow meter system and mass flow controller system including the same

PROBLEM TO BE SOLVED: To provide an excellent mass flow meter etc. capable of flexibly coping with a change in the kind of gas etc. of a specimen fluid without necessitating special labor, and moreover accurately measuring a flow. SOLUTION: The mass flow meter includes: a sensor 2 for detecting the flow rate of the specimen fluid G flowing through a flow path 1; a setter 4c for setting a flow rate characteristic function K which is specified to each designated specimen fluid, and determines a flow rate based on an output value from the sensor 2, and an instrumental error correction parameter α which is independent of the low rate characteristic function, common to a plurality of the specimen fluids, and corrects an instrument error at each mass flow meter; and a flow calculator 4d for calculating the flow rate of the specimen fluid G based on the characteristic function K and the correction parameter α. COPYRIGHT: (C)2010,JPO&INPIT

Isobe Yasuhiro

Papers

Mass flow meter, mass flow controller, mass flow meter system and mass flow control system containing the mass flow meter and the mass flow controller

Mass flow controller system

Mass flow meter, mass flow controller, and mass flow meter system and mass flow controller system including the same

Mass flow meter, mass flow controller, mass flow meter system including these, and mass flow controller system

Mass flow controller system and control device