A fluidized bed reactor and a Siemens reactor are used to produce polycrystalline silicon. The process includes feeding the vent gas from the Siemens reactor as a feed gas to the fluidized bed reactor.

Silicon production with a fluidized bed reactor integrated into a siemens-type process

The present invention includes a step of separating an effluent produced in a hydrogenation step of making tetrachlorosilane (STC) react with hydrogen into trichlorosilane (TCS), into a chlorosilane fraction containing a hydrocarbon and a TCS fraction, and a chlorination step of making the chlorosilane fraction containing the hydrocarbon react with chlorine to form STC and a substance containing a chlorinated hydrocarbon, wherein the effluent containing STC produced in the chlorination step is circulated to the hydrogenation step. In the chlorination step, the chlorosilane fraction containing a hydrocarbon (capable of containing hyper-hydrogenated chlorosilanes) having a boiling point close to TCS is hyper-chlorinated to be converted and acquire a higher boiling point, which facilitates the hyper-chlorinated chlorosilanes and the hyper-chlorinated hydrocarbons to be separated into high concentration, and increases the purity of TCS to be finally obtained.

Method for producing trichlorosilane and method for producing polycrystalline silicon

The inventive method of producing silicon comprises reacting gaseous trichlorosilane with hydrogen to deposit silicon onto a substrate and to produce silicon tetrachloride by product, vaporizing the silicon tetrachloride by-product to form gaseous silicon tetrachloride, converting the gaseous silicon tetrachloride too finely divided silicon, forming a silicon melt by melting the finely divided silicon, and forming solid silicon from the silicon melt.

Production of silicon through a closed-loop process

Producing a custom-made halogenated polysilane mixture for silicon production comprises either processing (eg hydrogenating or methylating) a chemically or plasmachemically generated halogenated polysilane mixture in the gas or liquid phase, either directly or after separation into high-purity fractions in a distillation column, or controlling the composition of a plasmachemically generated polysilane mixture by controlling the plasma reactor and mass flows

Polysilane processing and use

Methods and apparatus for the production of high purity silicon including a fluidized bed reactor with one or more protective layers deposited on an inside surface of the fluidized bed reactor. The protective layer may be resistant to corrosion by fluidizing gases and silicon-bearing gases.

Fluidized bed reactor for production of high purity silicon

A process for preparing polycrystalline silicon comprising the steps of (A) reacting trichlorosilane with hydrogen thereby forming silicon and an effluent mixture comprising tetrachlorosilane and disilane described by formula HnCl6-nSi2 where n is a value of 0 to 6 and (B) co-feeding the effluent mixture and hydrogen to a reactor at a temperature within a range of about 600°C to 1200°C t hereby effecting hydrogenation of the tetrachlorosilane and conversion of the disilane to monosilanes

James Edward Kendig

Papers

Process for preparation of polycrystalline silicon