A system of Flash EEprom memory chips with controlling circuits serves as non-volatile memory such as that provided by magnetic disk drives. Improvements include selective multiple sector erase, in which any combinations of Flash sectors may be erased together. Selective sectors among the selected combination may also be de-selected during the erase operation. Another improvement is the ability to remap and replace defective cells with substitute cells. The remapping is performed automatically as soon as a defective cell is detected. When the number of defects in a Flash sector becomes large, the whole sector is remapped. Yet another improvement is the use of a write cache to reduce the number of writes to the Flash EEprom memory, thereby minimizing the stress to the device from undergoing too many write/erase cycling.

Flash EEprom system

An electrically erasable programmable read only memory (EEPROM) having a non conducting charge trapping dielectric, such as silicon nitride, sandwiched between two silicon dioxide layers acting as electrical insulators is disclosed. The invention includes a method of programming, reading and erasing the EEPROM device. The non conducting dielectric layer functions as an electrical charge trapping medium. A conducting gate layer is placed over the upper silicon dioxide layer. The memory device is programmed in the conventional manner, using hot electron programming, by applying programming voltages to the gate and the drain while the source is grounded. Hot electrons are accelerated sufficiently to be injected into the region of the trapping dielectric layer near the drain. The device, however, is read in the opposite direction from which it was written, meaning voltages are applied to the gate and the source while the drain is grounded. Application of relatively low gate voltages combined with reading in the reverse direction greatly reduces the potential across the trapped charge region. This permits much shorter programming times by amplifying the effect of the charge trapped in the localized trapping region. In addition, the memory cell can be erased by applying suitable erase voltages to the gate and the drain so as to cause electrons to be removed from the charge trapping region of the nitride layer. Similar to programming, a narrower charge trapping region enables much faster erase cycles.

Two bit non-volatile electrically erasable and programmable semiconductor memory cell utilizing asymmetrical charge trapping

Structures, methods of manufacturing and methods of use of electrically programmable read only memories (EPROM) and flash electrically erasable and programmable read only memories (EEPROM) include split channel and other cell configurations. An arrangement of elements and cooperative processes of manufacture provide self-alignment of the elements. An intelligent programming technique allows each memory cell to store more than the usual one bit of information. An intelligent erase algorithm prolongs the useful life of the memory cells. Use of these various features provides a memory having a very high storage density and a long life, making it particularly useful as a solid state memory in place of magnetic disk storage devices in computer systems.

Highly compact EPROM and flash EEPROM devices

A novel apparatus and method for programming and reading a programmable read only memory (EPROM) having a trapping dielectric layer (20) sandwiched between two silicon dioxide layers (18, 20) is disclosed that greatly reduces the programming time of conventional PROM devices. Examples of the trapping dielectric material are silicon oxide-silicon, nitride-silicon oxide (ONO) and silicon dioxide with buried polysilicon islands. A nonconducting dielectric layer functions as an electrical charge trapping medium. This charging trapping layer is sandwiched between two layers of silicon dioxide acting as an electrical insulator. A conducting gate layer (24) is placed over the upper silicon dioxide layer (22). The memory device (10) is programmed in the conventional manner. The device, however, is read in the opposite direction from which it was written, meaning voltages are applied to the gate (24) and the source (14) while the drain is grounded. For the same applied gate voltage, reading in the reverse direction greatly reduces the potential across the trapped charge region.

Non-volatile semiconductor memory cell utilizing asymmetrical charge trapping

In one embodiment of the present invention, a memory storage system for storing information organized in sectors within a nonvolatile memory bank is disclosed. The memory bank is defined by sector storage locations spanning across one or more rows of a nonvolatile memory device, each the sector including a user data portion and an overhead portion. The sectors being organized into blocks with each sector identified by a host provided logical block address (LBA). Each block is identified by a modified LBA derived from the host-provided LBA and said virtual PBA, said host-provided LBA being received by the storage device from the host for identifying a sector of information to be accessed, the actual PBA developed by said storage device for identifying a free location within said memory bank wherein said accessed sector is to be stored. The storage system includes a memory controller coupled to the host; and a nonvolatile memory bank coupled to the memory controller via a memory bus, the memory bank being included in a non-volatile semiconductor memory unit, the memory bank has storage blocks each of which includes a first row-portion located in said memory unit, and a corresponding second row-portion located in each of the memory unit, each of the memory row-portions provides storage space for two of said sectors, wherein the speed of performing write operations is increased by writing sector information to the memory unit simultaneously.

Increasing the memory performance of flash memory devices by writing sectors simultaneously to multiple flash memory devices

A non-volatile semiconductor memory is described incorporating a fixed threshold transistor and a variable threshold transistor in each memory cell. The fixed threshold transistor is used for row selection while the variable threshold transistor stores the data. A common memory gate line throughout the memory permits block erase to one logic state with opposite data being written in on a row-by-row basis. Information is read out from a selected row by a ramp voltage on the memory gate line which is capacitively coupled through variable threshold transistors having a channel in the body below the gate region.

Common memory gate non-volatile transistor memory

An MOS transistor constructed using silicon on sapphire technology in which the channel region can be electrically connected either to the source or drain terminal is disclosed. The transistor is advantageous in that the shift of the threshold voltage of the transistor in the presence of radiation is substantially decreased. Connecting the channel region of the transistor to the source terminal also substantially reduces what is normally referred to as the "kink" effect in MOS transistors utilizing floating substrate channel regions. Reducing the sensitivity to radiation and the kink effect results in a transistor having improved electrical characteristics.

Silicon on sapphire MOS transistor

A complementary metal oxide semiconductor (CMOS) circuit is described incorporating Schottky barrier diodes in parallel with the source or drain of either the P or N channel transistors to reduce the minority current injected into the body at times the source or drain of either the N or P channel transistors are forward biased. The Schottky diode may be fabricated by making enlarged openings exposing both the body (substrate) and drain or source region and by using a metallization which may form an ohmic contact with the drain or source region and at the same time for a Schottky diode with the substrate. By incorporating Schottky barrier diodes parallel to the drain or source the P and N-type transistors are not current limited by the barrier height of only a Schottky diode acting as the source and at the same time minority current is not injected into the substrate or body at times the drain or source is forward biased. An input and output protection network is also described incorporating Schottky diodes.

Prevention of latch-up in CMOS integrated circuits using Schottky diodes

An MNOS memory array including circuitry to permit all of the memory devices comprising the array to be addressed for purposes of clearing the array by a block select and a clear signal as disclosed. The circuitry is arranged such that a plurality of arrays may be interconnected to form a large block oriented memory system with all blocks utilizing a common clear signal.

Circuit producing a common clear signal for erasing selected arrays in a mnos memory system

An improved memory for storing digital data is described incorporating two variable threshold transistors per memory cell which are written in opposite directions concomitantly by applying a polarizing voltage across the gate insulator of each transistor. Subsequent writing into the memory cell is limited by means of sensing the data stored and comparing it with the data to be written to permit only write cycles where the data stored would be opposite. The variable threshold transistors are thereby operated out of saturation by shifting the voltage thresholds back and forth in opposite directions. By utilizing two variable threshold devices per memory cell, data is sensed by the difference in the conductance of the two devices providing a wider detection window.

James R Cricchi

Papers

Common memory gate non-volatile transistor memory

Silicon on sapphire MOS transistor

Prevention of latch-up in CMOS integrated circuits using Schottky diodes

Circuit producing a common clear signal for erasing selected arrays in a mnos memory system

MNOS non-volatile memory with write cycle suppression