J
Jeffrey I. Hirsh
Researcher at Eastman Kodak Company
Publications - 12
Citations - 261
Jeffrey I. Hirsh is an academic researcher from Eastman Kodak Company. The author has contributed to research in topics: Layer (electronics) & Photoresist. The author has an hindex of 8, co-authored 12 publications receiving 260 citations.
Papers
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Patent
Pattern transfer techniques for fabrication of lenslet arrays for solid state imagers
Joseph F. Revelli,Jeffrey I. Hirsh,Joseph Jech,Douglas R. Robello,Stephen P. Barry,Alan C. G. Nutt +5 more
TL;DR: In this article, a method for forming lenslets which collect light and focus the light onto photosensitive elements of an electronic imager is presented, which includes providing a transparent lenslet-forming layer on a substrate or on layers on the substrate, forming a thin etch-stop layer on the transparent lenslets, and patterning a thin photosensitive resin mask on the etchstop layer so that the mask pattern corresponds to lenslets to be formed.
Journal ArticleDOI
All-dielectric high-efficiency reflection gratings made with multilayer thin-film coatings
Lifeng Li,Jeffrey I. Hirsh +1 more
TL;DR: A high-efficiency grating is made by coating a nine-layer quarter-wave system of ZnS/Na(3)AlF(6) directly onto a surface-relief grating in photoresist in qualitative agreement with theoretical predictions.
Patent
Electrostrictive micro-pump
TL;DR: In this paper, an electrostrictive micro-pump is provided for controlling a fluid flow through a cannula or other narrow liquid conduit, and a control assembly coupled to the viscoelastic material for electrostatically inducing a peristaltic wave along the longitudinal axis of the pump element to displace fluid disposed within the pump body.
Patent
Mandrel for forming a nozzle plate having orifices of precise size and location and method of making the mandrel
Jeffrey I. Hirsh,Xin Wen +1 more
TL;DR: In this paper, a mandrel is formed by overcoating a substrate with a metal film and applying an etchant to create an annular opening in the film defining a column of precise diameter at the center of each opening.
Patent
Pattern transfer techniques for fabrication of lenslet arrays using specialized polyesters
TL;DR: In this article, a method for forming lenslets which collect light and focus it onto photosensitive elements of an electronic imager includes providing a transparent lenslet-forming layer on a substrate or on layers on the substrate, and removing the thin etch-stop mask; and thermally reflowing the patterned transparent layer to form the transparent lenslets.