A dermatologic treatment apparatus is disclosed that is cordless and sufficiently compact as to be hand-held. A self-contained housing is configured for gripping by a person's hand for cordless manipulation in a dermatologic treatment procedure. A light source and electrical circuit are contained within the housing. The circuit includes one or more batteries and an electronic control circuit for energizing the light source to produce output light pulses. A light path is within the housing including an aperture through which the output light pulses are propagated out of the housing having properties sufficient for providing efficacious treatment.

Self-contained, diode-laser-based dermatologic treatment apparatus

A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Lithographic apparatus, and device manufacturing method

A microscopy and/or lithography system uses a comparatively low-resolution image projection system, which has a very small numerical aperture but large image field, in conjunction with a microlens array comprising miniature lens elements, each of which has a large numerical aperture but very small field. The projection system contains a small aperture stop which is imaged by the microlenses onto an array of diffraction-limited microspots on the microscope sample or printing surface at the microlens focal point positions, and the surface is scanned to build up a complete raster image from the focal point array. The system design thus circumvents the tradeoff between image resolution and field size which is the source of much of the complexity and expense of conventional wide-field, high-NA microscopy and microlithography systems. The system makes possible flat field, distortion-free imaging, with accurate overlay, focus, and warp compensation, over very large image fields (larger than the practical limits of conventional imaging means). In one embodiment it would use a Digital Micromirror Device as the image source, potentially eliminating the need for photomasks in semiconductor manufacture.

Microlens scanner for microlithography and wide-field confocal microscopy

A method of forming a three-dimensional object, comprises providing a carrier and an optically transparent member having a build surface, the carrier and the build surface defining a build region therebetween; filling the build region with a polymerizable liquid; irradiating the build region through the optically transparent member to form a solid polymer from the polymerizable liquid while concurrently advancing the carrier away from the build surface to form the three-dimensional object from the solid polymer, while also concurrently: (i) continuously maintaining a dead zone of polymerizable liquid in contact with the build surface, and (ii) continuously maintaining a gradient of polymerization zone between the dead zone and the solid polymer and in contact with each thereof, the gradient of polymerization zone comprising the polymerizable liquid in partially cured form. Apparatus for carrying out the method is also described.

Continuous liquid interphase printing

The present invention relates to methods and an apparatus for the fabrication of solid three-dimensional objects from liquid polymerizable materials.

Method and apparatus for three-dimensional fabrication

The invention is a seamless, projection lithography system that eliminates the need for masks through the use of a programmable Spatial Light Modulator (SLM) with high parallel processing power. Illuminating the SLM with a radiation source (1) provides a patterning image of many pixels via a projection system (4) onto a substrate (5). The preferred SLM is a Deformable Micromirror Device (3) for reflective pixel selection using a synchronized pulse laser. An alternative SLM is a Liquid Crystal Light Valve (LCLV) (45) for pass-through pixel selection. Electronic programming enables pixel selection control for error correction of faulty pixel elements. Pixel selection control also provides for negative and positive imaging and for complementary overlapping polygon development for seamless uniform dosage. The invention provides seamless scanning motion by complementary overlap to equalize radiation dosage, to expose a pattern on a large area substrate (5). The invention is suitable for rapid prototyping, flexible manufacturing, and even mask making.

Seamless, maskless lithography system using spatial light modulator

A system is described for recycling radiation reflected by an illuminated patterning mask in a via-hole drilling or exposure tool. The mask is illuminated by high-energy laser radiation, and the illuminated region is imaged onto a substrate by a projection, proximity, or contact method. The source radiation is suitably shaped by a lens assembly and focused into an optical intensity homogenizer with the desired numerical aperture. The homogenizer has the base function of converting the focused beam to self-luminous light required for drilling of via-holes or other processes accomplished by the tool, while maintaining the numerical aperture of the beam. The homogenizer also participates in the radiation-recycling function. An apertured reflector allows radiation from the source to enter the homogenizer. The radiation passing through and exiting the homogenizer is image by a lens to illuminate a portion of the mask. Radiation incident on transparent areas of the mask coming propagates to the substrate, but radiation incident upon reflective regions of the mask coating is reflected back into the homogenizer. The apertured reflector at the entry port of the homogenizer has a reflective back surface which returns the majority of the light re-entering the homogenizer to the patterning mask. The effective illumination intensity is greatly increased by the recycling of the back-reflected radiation, allowing for a reduction in source power or decrease in exposure time for the drilling of via-holes or other exposure processes.

High-efficiency, energy-recycling exposure system

In numerous applications of large-area patterning systems, the preferred image magnification is unity However, in some applications, the size of the substrate may change slightly due to various thermal and/or chemical processing steps To compensate for scale changes of the substrate, the magnification of the imaging system must vary slightly from unit magnification (typically by a fraction of a percentage) so that a layer already patterned on the substrate will have, after processing, proper image registration with the subsequent layer This disclosure describes a lithography system for exposing large substrates at high imaging resolution and high exposure throughput, and specifically relates to a scan-and-repeat patterning system that employs a unitary mask-substrate stage and enables projection imaging of a substrate with capability to control the image magnification to compensate for changes of substrate dimensions occurring as a result of previous process steps A combination of optical and mechanical compensation is used to provide the necessary magnification control, including anamorphic magnification variation in which the fine adjustment is of different magnitudes in x and y dimensions The optical control is provided by a projection lens with anamorphic magnification adjustment capability The mechanical compensation is performed by providing a differential relative velocity between the mask and substrate during scanning

Jeffrey M. Hoffman

Papers

Seamless, maskless lithography system using spatial light modulator

High-efficiency, energy-recycling exposure system

Large-area, scan-and-repeat, projection patterning system with unitary stage and magnification control capability