The author presents the future prospect for LSI utilization in communication systems, a short history of IC development at Nippon Laboratories, and an outline of the LSI project. The initial targets of the project and some results obtained in LSI design and fabrication, including progress in processing tools, are shown.

Impact of VLSI from communications viewpoint

2014 A precision electron beam exposure system, EB52, has been developed for mask making and direct wafer exposure for less than 2 03BCm minimum pattern size. This paper describes the system control method and performance of the system components which are designed considering positioning error factors, and an example of chrome mask fabrication by the system, in which overlay accuracy of ± 0.2 03BCm has been achieved with deflection distortion correction and beam shift correction using a standard mark on the X-Y stage. REVUE DE PHYSIQUE APPLIQUÉE TOME 13, DÉCEMBRE 1978,

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K. Kinamari

Papers

Precision electron beam exposure system, EB52