Carrier concentration profiles of two-dimensional electron gases are investigated in wurtzite, Ga-face AlxGa1−xN/GaN/AlxGa1−xN and N-face GaN/AlxGa1−xN/GaN heterostructures used for the fabrication of field effect transistors. Analysis of the measured electron distributions in heterostructures with AlGaN barrier layers of different Al concentrations (0.15<x<0.5) and thickness between 20 and 65 nm demonstrate the important role of spontaneous and piezoelectric polarization on the carrier confinement at GaN/AlGaN and AlGaN/GaN interfaces. Characterization of the electrical properties of nominally undoped transistor structures reveals the presence of high sheet carrier concentrations, increasing from 6×1012 to 2×1013 cm−2 in the GaN channel with increasing Al-concentration from x=0.15 to 0.31. The observed high sheet carrier concentrations and strong confinement at specific interfaces of the N- and Ga-face pseudomorphic grown heterostructures can be explained as a consequence of interface charges induced by ...

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Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructures

Recent research results pertaining to InN, GaN and AlN are reviewed, focusing on the different growth techniques of Group III-nitride crystals and epitaxial films, heterostructures and devices. The chemical and thermal stability of epitaxial nitride films is discussed in relation to the problems of deposition processes and the advantages for applications in high-power and high-temperature devices. The development of growth methods like metalorganic chemical vapour deposition and plasma-induced molecular beam epitaxy has resulted in remarkable improvements in the structural, optical and electrical properties. New developments in precursor chemistry, plasma-based nitrogen sources, substrates, the growth of nucleation layers and selective growth are covered. Deposition conditions and methods used to grow alloys for optical bandgap and lattice engineering are introduced. The review is concluded with a description of recent Group III-nitride semiconductor devices such as bright blue and white light-emitting diodes, the first blue-emitting laser, high-power transistors, and a discussion of further applications in surface acoustic wave devices and sensors.

https://iopscience.iop.org/article/10.1088/0022-3727/31/20/001/pdf

Growth and applications of Group III-nitrides

Thin film piezoelectric materials offer a number of advantages in microelectromechanical systems (MEMS), due to the large motions that can be generated, often with low hysteresis, the high available energy densities, as well as high sensitivity sensors with wide dynamic ranges, and low power requirements This paper reviews the literature in this field, with an emphasis on the factors that impact the magnitude of the available piezoelectric response For non-ferroelectric piezoelectrics such as ZnO and AlN, the importance of film orientation is discussed The high available electrical resistivity in AlN, its compatibility with CMOS processing, and its high frequency constant make it especially attractive in resonator applications The higher piezoelectric response available in ferroelectric films enables lower voltage operation of actuators, as well as high sensitivity sensors Among ferroelectric films, the majority of the MEMS sensors and actuators developed have utilized lead zirconate titanate (PZT) films as the transducer Randomly oriented PZT films show piezoelectric e(31, f) coefficients of about - 7 C/m(2) at the morphotropic phase boundary In PZT films, orientation, composition, grain size, defect chemistry, and mechanical boundary conditions all impact the observed piezoelectric coefficients The highest achievable piezoelectric responses can be observed in {001} oriented rhombohedrally-distorted perovskites For a variety of such films, e(31,f) coefficients of - 12 to - 27 C/m(2) have been reported

Thin Film Piezoelectrics for MEMS

Aluminum nitride thin films have been grown by reactive magnetron sputter technique using a pulsed power supply. The highly (002)-textured columnar films deposited on platinized silicon substrates exhibited quasi-single-crystal piezoelectric properties. The effective d33 was measured as 3.4 pm/V, the effective e31 as 1.0 C/m2. The pyroelectric coefficient turned out to be positive (4.8 μC m−2 K−1) due to a dominating piezoelectric contribution. Thin-film bulk acoustic resonators (TFBAR) with fundamental resonance at 3.6 GHz have been fabricated to assess resonator properties. The material parameters derived from the thickness resonance were a coupling factor k=0.23 and a sound velocity vs=11 400 m/s. With a quality factor Q of 300, the TFBARs proved to be apt for filter applications. The temperature coefficient of the frequency could be tuned to practically 0 ppm/K.

Properties of aluminum nitride thin films for piezoelectric transducers and microwave filter applications

We have carried out first-principles total energy calculations to investigate electronic and elastic properties of both zinc-blende and wurtzite BN, AlN, and GaN. We have calculated lattice parameters, elastic constants, deformation potential constants, phonon frequencies at Γ point, Born effective charges, and piezoelectric constants. Lattice parameters are fully relaxed by using the first-principles molecular dynamics method with variable cell shape. The internal strain in a strained crystal is also relaxed by the first-principles molecular dynamics method. The internal strain influences the elastic constants, the deformation potential constants, and the piezoelectric constants effectively. We have calculated the wurtzite deformation potential constants D1–D5 considering the internal strain correction. The piezoelectric constants of wurtzite and also zinc-blende crystals have been calculated using the Berry phase approach and we have found from first principles that those of BN have an inverse sign in c...

First-principles study on electronic and elastic properties of BN, AlN, and GaN

De nouvelles technologies de couches minces sont indispensables pour integrer les dispositifs a onde acoustique de surface ayant un coefficient de variation thermique nul avec des dispositifs semiconducteurs actifs sur une meme pastille, ce qui donnerait un circuit integre a haute frequence sur support de silicium ou support de silicium sur saphir. Les couches minces de AlN ont un interet dans le domaine du GHz a cause de la vitesse de propagation elevee. Des lignes a retard a coefficient de variation thermique nul fonctionnant au-dela de 1 GHz sont fabriquees avec une combinaison AlN/saphir. Croissance cristalline; evaluation des parametres; pertes de propagation, dispersion en frequence, epaisseur de couches; coefficient de variation thermique du retard; insertion dans le circuit integre; effet de la temperature sur le correlateur d'ondes acoustiques de surface

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K. Tsubouchi

Papers

Zero-Temperature-Coefficient SAW Devices on AlN Epitaxial Films