Presented are methods, systems, and apparatuses for managing and maintaining an electronic device such as a sensor apparatus.

Sensor apparatus management methods and apparatus

A reticle having a pellicle frame and pellicle membrane is cleaned without removing or damaging the pellicle membrane. A cover encases the pellicle membrane and pellicle frame, sealing the pellicle from the external environment during a cleaning process. The cover fits around the periphery of the pellicle frame and covers the pellicle membrane. An edge of the cover in contact with the reticle forms a seal. The reticle is fastened to reticle supports on a spin chuck during the cleaning process. An anchor plate presses the cover to the reticle, maintaining the pellicle sealed from the external environment. The cover and reticle are sandwiched together between the anchor plate and spin chuck.

Reticle cleaning without damaging pellicle

A reticle carrier used in semiconductor manufacture. The carrier includes a bottom cover and a top cover having a transparent window. A protective lid may also be included. The box includes ports to allow nitrogen gas to enter and purge the inside. The transparent window is used for inspection and photochemical clean. However, since no material is available which can suitably handle smaller wavelength radiation, the reticle is removed from the carrier when exposure at these wavelengths is required.

Euv reticle carrier with removable pellicle

A vial plate (2) includes a base plate (4) having protrusions (8) spaced from each other to form compartments (10) for supporting vials and openings (12) which allow the flow of liquids or gases to heat or cool the vials. The vial plate (2) may have a cover (22) and use a multi-tiered structure having one or more spacers (16) which attach to the base plate (4), each other, or the cover (22) to vary the height of the vial plate (2) for accommodating vials of different sizes. The vial plate (2) does not float in water, can accommodate vials containing volatile solvents, and can support individual vials.

Multi-tier vial plate

A container 2 for flat panel comprising: a lower end holding resilient member 38 disposed on a bottom end of a lower end bottom groove 32 to which a lower end of the flat panel 34 contained in the container 2 is inserted, and an upper end holding resilient member 50 having a belt shaped portion covering an upper end of the flat panel 34 along the longitudinal direction thereof. The upper end holding resilient member 50 has an U-shaped cross section, a pair of fitting rods extending along the longitudinal direction thereof are attached at both sides of both ends of the longitudinal direction thereof, and each end of each fitting rod 52 is attached removably in an engagement groove 58 of an adapter 56 attached in the container 2. In accordance with the container 2 for flat panel of the present invention, it is possible to take custody of or transport a plural of flat panels such as glass substrates used for flat display devices without destroying them and contaminating the surfaces of them.

Container for flat panel

The present invention relates to a case for a photomask to prevent generation of dust which might attach to and stain a photomask or the photomask pellicle. In a case for a photomask comprising a case main unit with an upper opening for accommodating the photomask and a lid for the opening of the case main unit, cushion materials are provided on the inner bottom of the case main unit and on the inner ceiling of the lid. The photomask is elastically squeezed between the cushion materials when accommodated. Thus, shaking and rattling during transportation are prevented to minimize the generation of dust. As the cushion material, a rubber material having a smooth surface on one side and a coarse surface on the other side is used.

Case for photomask

A photomask with pellicle which is treated so that even if the obverse and reverse surfaces of the photomask are stained with a trace amount of contaminative particles during cleaning, water content and a low-volatile component are prevented from adhering to such contaminative particles during storage, thereby preventing the photomask from becoming stained with passage of time. Also disclosed is a method of treating and storing the photomask. The photomask is subjected to a hydrophobic treatment by providing the obverse and reverse surfaces thereof with a trimethylsilyl film formed by a reaction of OH groups in these surfaces with 1,1,1,3,3,3-hexamethyldisilazane. Even if contaminative particles are attached to the obverse and reverse surfaces of the photomask in a trace amount during cleaning, no water content or low-volatile component will adhere to such contaminative particles during storage and/or transport of the photomask with a pellicle attached thereto, so that the photomask is prevented from becoming stained with passage of time. Accordingly, the photomask with pellicle can be stably stored for a long period of time and also stably transported, and it can be used any number of times for a long period of time.

Kazuhiro Tabuchi

Papers

Case for photomask

Photomask with pellicle and method of treating and storing the same