Showing papers by "Kazuo Hara published in 1985"
Patent•
30 Jul 1985
TL;DR: In this article, a high frequency ion plating device was proposed to provide a constant duration of high frequency discharge in a rotating portion of an evaporation substrate, where an auxiliary electrode such as a coil was added to the substrate.
Abstract: In a high frequency ion plating device, when an evaporation substrate is intended to be rotated to form a uniform evaporated film, a variation in resistance of a contact in a rotating portion arises, making it almost impossible to provide a constant duration of high frequency discharge. A supply of a high frequency power to the substrate is effected through an auxiliary electrode such as a coil, and a dc voltage is induced in the auxiliary electrode and applied to the substrate simultaneously with a high frequency voltage. As a result of the coil the high frequency discharge is stabilized, and a stabilized supply of power is rendered possible.
6 citations