K
Kazuya Dobashi
Researcher at Tokyo Electron
Publications - 34
Citations - 463
Kazuya Dobashi is an academic researcher from Tokyo Electron. The author has contributed to research in topics: Substrate (printing) & Nozzle. The author has an hindex of 9, co-authored 34 publications receiving 463 citations.
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Patent
Substrate cleaning apparatus and vacuum processing system
Kazuya Dobashi,Kensuke Inai,Akitaka Shimizu,Kenta Yasuda,Yu Yoshino,Toshihiro Aida,Takehiko Senoo +6 more
TL;DR: A substrate cleaning apparatus includes a supporting unit, provided in a processing chamber having a gas exhaust port, for supporting a substrate; one or more nozzle units, each for ejecting gas clusters to a peripheral portion of the substrate supported by the supporting unit to remove unnecessary substances from the peripheral portion as mentioned in this paper.
Patent
Component for semicondutor processing apparatus and manufacturing method thereof
TL;DR: In this article, an amorphous oxide of a first element selected from the group consisting of aluminum, silicon, hafnium, zirconium, and yttrium was used as a protection film.
Patent
Plasma Generation Method, Cleaning Method, and Substrate Processing Method
TL;DR: In this paper, a toroidal plasma generator that includes a gas passage having a gas entrance and a gas outlet forming a circuitous path and a coil wound around a part of the gas passage includes the steps of supplying a mixed gas of an Ar gas and an NF3 gas containing at least 5% of NF3 and igniting plasma by driving the coil with a high-frequency power, wherein the plasma ignition step is conducted under a total pressure of 6.65-66.5 Pa.
Patent
Component for semiconductor processing apparatus and manufacturing method thereof
TL;DR: In this article, an amorphous oxide of a first element selected from the group consisting of aluminum, silicon, hafnium, zirconium, and yttrium was used as a protection film.
Patent
Method for generating plasma method for cleaning and method for treating substrate
TL;DR: In this article, a toroidal plasma generator with a passage having a gas inlet and a gas outlet and a coil wound around a part of the gas passage is described, which comprises a step of supplying a mixed gas of an Ar gas containing at least 5 % of NF3 and an NF3 gas and driving the coil by a high frequency electric power, to thereby ignite the plasma, wherein the plasma ignition step is carried out under a total pressure of 6.65 to 66.5 Pa.