L
Linyong Pang
Publications - Â 5
Citations - Â 227
Linyong Pang is an academic researcher. The author has contributed to research in topics: Optical proximity correction & Lithography. The author has an hindex of 5, co-authored 5 publications receiving 208 citations.
Papers
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Proceedings ArticleDOI
Fast inverse lithography technology
Daniel S. Abrams,Linyong Pang +1 more
TL;DR: This work discusses how one can find the optimal photomask by rigorously solving the lithography inverse problem and finds highly optimal solutions which do not arise from traditional ad hoc approaches.
Proceedings ArticleDOI
Inverse lithography technology (ILT): What is the impact to the photomask industry?
Linyong Pang,Yong Liu,Dan Abrams +2 more
TL;DR: Inverse Lithography Technology (ILT) as discussed by the authors is a rigorous approach to determine the mask shapes that produce the desired on-wafer results, which is more computationally scalable and avoids laborious segmentation script-writing.
Proceedings ArticleDOI
Inverse lithography technology principles in practice: unintuitive patterns
TL;DR: In this paper, the authors present unintuitive patterns generated by inverse lithography technology for contact hole masks, which can be generated in substantially simpler form with proper constraints without losing the spirit of ILT masks.
Proceedings ArticleDOI
Laser and e-beam mask-to-silicon with inverse lithography technology (ILT)
TL;DR: In this article, ILT was applied to create binary chrome-on-glass (CoG) masks with feature sizes ranging from 130 nm to 45 nm (at the wafer scale).
Proceedings ArticleDOI
Inverse lithography technology at low k1: placement and accuracy of assist features
TL;DR: In this article, an implementation of inverse lithography technology is studied with special attention to the placement, accuracy, and efficacy of subresolution assist elements, and 2D capability is demonstrated for repeated patterns.