Thickness dependent electrical resistivity of ultrathin (<40 nm) Cu films

The metallicity of thin films and overlayers

The base layer effect on the d.c. conductivity and structure of direct current magnetron sputtered thin films of silver

Surface phases on silicon

Light–matter interaction at the atomic scale rules fundamental phenomena such as photoemission and lasing while enabling basic everyday technologies, including photovoltaics and optical communicati...

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Plasmonics in Atomically Thin Crystalline Silver Films.

The diffuse scattering of conduction electrons at a rough surface has a considerable contribution to the resistivity of thin films, which is well known as the classical size effect We have separated this contribution from other scattering mechanisms such as the phonon and bulk defect scattering by the following procedure: Silver was deposited at low temperatures (\ensuremath{\approxeq}130 K) onto a well-annealed relatively thick silver base layer (\ensuremath{\approxeq}24 nm), which has been deposited onto a Si(111)-7\ifmmode\times\else\texttimes\fi{}7 substrate During deposition the resistivity of the thin film was measured in situ, and afterwards the surface roughness was determined quantitatively with profile analysis of low-energy electron diffraction An increase of both resistivity and surface roughness was observed Such an increase of the measured resistivity must be due to the increase of surface roughness because there was no change in temperature or concentration of bulk defects With the measured surface roughness we are able to evaluate the additional resistivity without any free parameters The experiment reveals excellent agreement with the theoretical predictions

M. Kennedy

Papers

Surface roughness and conductivity of thin Ag films.