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Maneswar Rahang

Researcher at National Institute of Technology, Meghalaya

Publications -  25
Citations -  179

Maneswar Rahang is an academic researcher from National Institute of Technology, Meghalaya. The author has contributed to research in topics: Electrical discharge machining & Surface roughness. The author has an hindex of 4, co-authored 19 publications receiving 108 citations. Previous affiliations of Maneswar Rahang include National Institute of Technology, Silchar.

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Parametric Optimization for Selective Surface Modification in EDM Using Taguchi Analysis

TL;DR: In this article, a hard layer of tungsten and copper mixture is created at selected area of aluminum surface using W-Cu powder metallurgical green compact tool and masking technique in die-sinking electric discharge machining.
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Surface modification of CFRP composite using reverse-EDM method

TL;DR: In this paper, the surface characteristics of carbon fiber reinforced polymer (CFRP) composites were investigated by depositing tungsten and copper powder on its surface using electrical discharge machining (EDM) process.
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Reverse EDM process for pattern generation using powder metallurgical green compact tool

TL;DR: In this paper, the authors described about the generation of complex shaped pattern using reverse electro discharge machining process and powder metallurgical green compact tool has been used to generate a predefinite pattern.
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Pattern generation by selective area deposition of material in EDM

TL;DR: In this article, a process of pattern generation by selective area deposition of material on aluminum workpiece is described, using a Tungsten-copper powder metallurgical green compact tool and polyvinyl polypropylene (polypropylene) polyethylene.
Journal Article

Application of masking technique in EDM for generation of rectangular shaped pattern

TL;DR: In this paper, a shape masking technique was used for pattern generation in electric discharge machining (EDM) using P/M green compacts of composition 75%W-25%Cu and aluminium as work material.