The present invention relates to a power semiconductor device such as a diode and thyristor. In a semiconductor device such as a diode and thyristor having at least one pn junction between a pair of main surfaces, a first main electrode is formed on the surface of one of the main surfaces and a second main electrode is formed on the surface of the other one of the main surfaces. A semiconductor lattice defect is formed such that its lattice defect density increases gradually in the direction from the first main electrode to the second main electrode. Since the distribution of carrier density in the conduction state can be flattened according to the invention, the reverse recovery charge can be reduced substantially without causing the ON-state voltage to increase.

Power semiconductor device

GaN-based half bridge power conversion circuits employ control, support and logic functions that are monolithically integrated on the same devices as the power transistors. In some embodiments, a low side GaN device communicates through one or more level shift circuits with a high side GaN device. Both the high side and the low side devices may have one or more integrated control, support and logic functions.

Half bridge driver circuits

An electronic circuit is disclosed. The electronic circuit includes a substrate having GaN, and a power switch formed on the substrate and including a first control gate and a first source. The electronic circuit also includes a drive circuit formed on the substrate and including an output coupled to the first control gate, and a power supply having a supply voltage and coupled to the drive circuit, where the output can be driven to the supply voltage.

GaN circuit drivers for GaN circuit loads

GaN-based half bridge power conversion circuits employ control, support and logic functions that are monolithically integrated on the same devices as the power transistors. In some embodiments a low side GaN device communicates through one or more level shift circuits with a high side GaN device. Both the high side and the low side devices may have one or more integrated control, support and logic functions. Some devices employ electro-static discharge circuits and features formed within the GaN-based devices to improve the reliability and performance of the half bridge power conversion circuits.

Half bridge power conversion circuits using GaN devices

A high-voltage integrated circuit device can include, in a surface layer of a p semiconductor substrate, an n region which is a high-side floating-potential region, an n − region which becomes a high-voltage junction terminating region, and an n − region which is an L-VDD potential region. A low-side circuit portion can be disposed in an n − region. Below a pickup electrode disposed in the high-voltage junction terminating region, a universal contact region in Ohmic contact with the pickup electrode can be disposed. The universal contact region has a p + region and an n + region that can be disposed in alternating contact along a surface of the p semiconductor substrate. By disposing the universal contact region in this way, the quantity of carriers flowing into the low-side circuit portion can be reduced when a negative surge voltage is input. Consequently, erroneous operation due to latchup of a logic portion can be minimized.

High voltage integrated circuit device

Aspects of the present invention provide a high-voltage semiconductor device and a high voltage integrated circuit device while minimizing or eliminating the need for the addition of back surface steps. Aspects of the invention provide a high-voltage semiconductor device that achieves, low voltage driving and quick response by way of stable high voltage wiring and a low ON voltage. In some aspects of the invention, a high-voltage semiconductor device can include a semiconductor layer is formed on a support substrate interposing an embedded oxide film therebetween. A high potential side second stage transistor and a low potential side first stage transistor surrounding the second stage transistor are formed on the surface region of the semiconductor layer. The source electrode of the second stage transistor is connected to the drain electrode of the first stage transistor. A drain electrode of the second stage transistor is connected to a drain pad.

Masaharu Yamaji

Papers

High-voltage semiconductor device