Masakazu Tokita

TL;DR: In this paper, a pattern inspection apparatus comprises a sensor data input section for inputting a two-dimensional inspected pattern as image data (sensor data) having a multivalued (non-binary) density distribution, a design data input Section for inputsting reference pattern data (reference data) corresponding to the inspected pattern, a compare section for making a comparison between the image data and the reference data to obtain the difference in density therebeween, a minimum compare section, and a first defect determining section for detecting a defect on the basis of the minimum obtained by the

TL;DR: In this article, a pattern of a target is photographed and an image of the check pattern is converted into a check image data, which is represented by pixel data and density data.

TL;DR: The development of a new low cost mask inspection technology with short Turn Around Time (TAT) is reported on, as a result of adopting a method of selecting defect detection sensitivity level for every local area defined by such factors as defect judgment algorithm and defect judgment threshold as one of the pseudo-defect-reduction technique necessary to shorten mask inspection TAT.

TL;DR: In this article, an electron beam drawing control system has a first memory which stores parameters specifying figures representing a pattern to be drawn in a number of cells, and a second memory stores dot pattern data generated by the figure generating device.

TL;DR: In this article, the authors report on the development of a new mask inspection technology that makes total inspection faster and less costly by selecting a defect detection sensitivity level for every local area, defined by defect judgment algorithm and defect judgment threshold.