The invention concerns an electrolyte for electroless deposition of metal layers with internal compressive stresses containing a metal base salt, a reducing agent, a complexing agent, an accelerator and a stabilizer. In order to make available an electrolyte of the said kind, from which uniform pore-free and crack-free metal-phosphorus coatings can be deposited with constant layers properties and high phosphorus contents at an elevated deposition rate over a long period of time, it is proposed by means of the invention that the electrolyte contain as metal base salt a metal salt whose anions contain at least one carbon atom and that is present in a starting concentration from 0.01 to 0.3 mol/L. At least one salt consisting of metal acetate, metal formate, metal oxalate, metal propionate, metal citrate and metal ascorbate, especially preferably metal acetate, is used as the metal salt whose anion contains at least one carbon atom. In addition, a method that is especially suitable for the use of the said electrolyte is proposed, where this method advantageously has a closed material circulation. Through the use of the invention especially pore-free and crack-free metal coatings with constant layer properties are uniformly deposited over a long time of use of the bath of at least 14-22 MTO.

Process and electrolytes for deposition of metal layers

The invention relates to a method for texturing silicon-containing surfaces and components. To this end, a metal-containing layer is placed upon a silicon-containing surface, whereupon this surface is etched in a solution consisting of HF or of NH4F or mixtures thereof and of an oxidizing agent. After texturing a surface structure, the surface shows typical structure sizes of 50 to 250 nm. The reflectivity of the silicon-containing surface is reduced by the method typically to less than 5 % as indicated in the illustration on the example of the reflection of a single-crystalline silicon surface textured with the method. The method can be used on materials of a different structural modification (single-crystalline, polycrystalline, nanocrystalline, protocrystalline or amorphous), for orienting, alloying and doping, and is particularly suited for components that are produced with the aid of thin-film technology. Components whose surfaces are textured with the aid of this method can be advantageously used as solar cells, photodetectors, light-emitting diodes or for launching and extracting light in waveguides.

Method for producing silicon-containing surfaces and optoelectronic components

The invention relates to a method for producing a textured silicon substrate, in particular a silicon wafer, comprising the following steps: a) applying an aqueous catalyst solution containing metal ions to the silicon substrate on one side; b) treating the silicon substrate with an acidic and/or basic etching solution containing at least one oxidant

Method for producing a textured silicon substrate

PURPOSE: A method for improving corrosion resistance of injection port for automobile fuel tank is provided to greatly improve corrosion resistance of injection port particularly for large commercial vehicle fuel tank by electroless plating nickel on inner and outer surfaces of the injection port for the fuel tank. CONSTITUTION: The method comprises a pretreatment step of dipping a fuel injection port into a pretreatment solution having a temperature of 25±5 deg.C in which 40±10 ml/L of degreasing agent is mixed with 200±20 ml/L of hydrochloric acid; a plating step performed by dipping the fuel injection port into a nickel solution having a temperature of 92±2 deg.C in which 250 ml/L of nickel chloride solution is mixed with 13 ml/L of polishing agent and additive solution for one hour after pretreatment step; and a drying step of drying the fuel injection port in an oven having a temperature of 55±5 deg.C for 3 minutes after the plating step, wherein thickness of nickel plated on the surface of the fuel injection port is 20 μm.

Method for preventing erosion of fuel inlet part of fuel tank

Die Erfindung betrifft ein Verfahren zur Herstellung eines texturierten Siliziumsubstrats, insbesondere Silizium-Wafers, umfassend folgende Arbeitsschritte: a) Einseitiges Aufbringen einer wassrigen Katalysatorlosung, enthaltend Metallionen, auf das Siliziumsubstrat; b) Behandlung des Siliziumsubstrats mit einer sauren und/oder basischen Atzlosung, enthaltend mindestens ein Oxidationsmittel.

Verfahren zur herstellung eines texturierten siliziumsubstrats

PROBLEM TO BE SOLVED: To prevent deterioration in the wettability of solder and the generation of cracking or the like in a nickel plating film caused by the reduction of the purity of nickel in the film SOLUTION: This electroless nickel plating bath contains nickel salt as a metal feeding source consisting essentially of at least one kind of nickel acetate and nickel chloride, a reducing agent composed of hydrazine and at least one kind among saccharin, the salt thereof and formalin

Electroless nickel plating bath

Verfahren zur Herstellung eines multikristallinen Siliziumsubstrats fur Solarzellen, umfassend: einen Metallabscheidungsschritt zum Abscheiden von Metallteilchen auf der Oberflache des multikristallinen Siliziumsubstrats; und einen Bohrschritt, um die Substratoberflache einem Atzen in einer Losung zum unterziehen, die eine oder mehrere Verbindungen enthalt, die aus Flusssaure und Wasserstoffperoxid ausgewahlt sind.

Matsuda Hitoshi

Papers

Electroless nickel plating bath

Verfahren zur Herstellung eines multikristallinen Siliziumsubstrats für Solarzellen