A sputtering target (1) comprises a substrate (2) and a target layer (3) which contains metal particles (4) and is deposited on the substrate (2) A fraction of the metal particles which has an aspect ratio of 15 or greater comprises 90% or more of the thickness-wise cross section of the target layer (3) in terms of the number of particles, wherein the aspect ratio means a ratio between X and Y (ie, a X/Y ratio), wherein X represents the maximum diameter and Y represents the minimum diameter of the metal particles (4) on the thickness-wise cross section of the target layer (3) The target layer (3) may be formed by the cold spray method

Sputtering target and method for production thereof

A sputtering target forming method, a sputtering target, and a method of using a sputtering target are herein disclosed. Large area sputtering targets are necessary for producing films on large area substrates. To save on material costs, the large area sputtering target can be formed of multiple target tiles that can be placed adjacent each other on a backing plate. The gaps that are present between the target tiles may to be filled to ensure that the backing plate does not sputter and contaminate the sputtering process. The material filling the gaps may be of the same composition as the sputtering target tiles. Alternatively, the entire sputtering target can be plasma sprayed onto the backing plate to ensure that the sputtering target has a unitary sputtering target body across the entire large area backing plate.

Large Area Sputtering Target

There is provided a metal powder for use in a selective laser sintering method for producing a three-dimensional shaped object, wherein the metal powder comprises a powder mixture of a precipitation-hardening metal composition. In particular, the metal powder of the present invention is configured to have a Fe-based component powder and a Ni-based component powder which are individually included in the powder mixture wherein a powder made of an alloy of Fe-based and Ni-based components is not included as a main powder in the powder mixture.

Metal powder for selective laser sintering, method for manufacturing three-dimensional shaped object by using the same, and three-dimensional shaped object obtained therefrom

Sputtering targets are produced which have an intermetallic stoichiometry which makes them ductile enough for maching and sputtering. The targets are produced from elemental or alloy powders or alloys, at least one of which is of very fine particle size, e.g., −400 mesh. The elemental or alloy powders are blended, canned, subjected to hot isostatic pressing at low temperatures and high pressures, formed into a billet, and machined to form the target.

Fabrication of ductile intermetallic sputtering targets

A sputter target for sputtering a silicon-containing film is provided. The target includes a silicon-containing sputter material layer, and a carrier for carrying the sputter material layer, wherein the sputter material layer contains less than 200 ppm iron.

Sprayed Si- or Si:Al-target with low iron content

A fully dense, powder-metallurgy produced maraging steel alloy article of prealloyed powder for use as a tool for high temperature applications. The article in the as-produced condition having a hardness less than 40 HRC to provide machinability and thereafter the article upon maraging heat treatment having a hardness greater than 45 HRC. A method for producing this article comprises compacting prealloyed powder to produce a fully dense article having a hardness less than 40 HRC and thereafter maraging heat treating to a hardness greater than 45 HRC.

A maraging steel article and method of manufacture

A silicon base binary alloy of prealloyed powder having less than 10% aluminum, excluding zero. The alloy may be in the form of gas atomized prealloyed powder, which powder may be consolidated to form an article. Preferably, the article is a sputtering target.

Silicon aluminum alloy of prealloyed powder and method of manufacture

Three important attributes of powder metallurgy (PM) materials justify their utilization in highly stressed and elevated-temperature applications: minimal segregation, fine grain size, and pore-free density. Widespread application of large-scale, prealloyed hot isostatically pressed (HIPed) PM components exists utilizing nickel-base, ferrous. titanium, and other nonferrous systems, taking advantage of the three cited attributes. In most areas, the applications also benefit from an improved level of ultrasonic inspection (UI) permitted by fine-grain. homogenous microstructures. A further benefit is the capability of producing entirely new alloy combinations utilizing nonequilibrium microstructures that result in higher property levels than do the microstructures that encumber many ingot metallurgy products. Applications illustrated here include PM clad steel mill rolls, plastic extrusion barrels and screws, rotating aircraft and land-based gas-turbine components, and titanium-boron alloys for air-frames. As the employment of HIPing-PM solutions becomes more extensive in the design community, the demand for these products, as well as the worldwide HIPing capacity, will dramatically increase beyond current high growth rates.

Applications for large-scale prealloyed hot isostatically pressed powder metallurgy materials

PROBLEM TO BE SOLVED: To provide an alloy which is used for a sputtering target, has excellent electro conductivity, scratch resistance and glare resistance, has a uniform composition, and in which a finished coating film does not become rough. SOLUTION: The two component silicon alloy of prealloyed powder contains aluminum ≤10 wt.% (exclusive of zero). The alloy is in a form of gas-atomized prealloyed powder. The powder is hardened by plasma spray for making the alloy. Preferably, the alloy is used as a sputtering target. COPYRIGHT: (C)2003,JPO

Mctiernan Brian J

Papers

A maraging steel article and method of manufacture

Silicon aluminum alloy of prealloyed powder and method of manufacture

Applications for large-scale prealloyed hot isostatically pressed powder metallurgy materials

Two component alloy