M
Michael G. Mauk
Publications - 5
Citations - 21
Michael G. Mauk is an academic researcher. The author has contributed to research in topics: Epitaxy & Thermophotovoltaic. The author has an hindex of 3, co-authored 5 publications receiving 19 citations.
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Journal ArticleDOI
Experimental assessment of metal solvents for low-temperature liquid-phase epitaxy of silicon carbide
TL;DR: In this paper, the results of an experimental survey of metal solvents for low-temperature liquid-phase epitaxy (LPE) of SiC on 6H-SiC substrates are reported.
Journal ArticleDOI
Vapor-phase epitaxial lateral overgrowth of ZnSe on GaAs
Michael G. Mauk,Bryan W. Feyock +1 more
TL;DR: In this article, the authors describe and demonstrate a process for ZnSe epitaxial lateral overgrowth (ELOG) on stripe-patterned, oxide-masked (1 1 1)GaAs substrates using a simple near-equilibrium chemical vapor transport process based on a reversible reaction mediated by hydrogen at atmospheric pressure.
Proceedings ArticleDOI
New concepts for III-V antimonide thermophotovoltaics
Michael G. Mauk,Zane A. Shellenbarger,Mark I. Gottfried,Jeffrey A. Cox,Bryan W. Feyock,James B. McNeely,Louis C. Dinetta,Robert L. Mueller +7 more
TL;DR: In this article, the authors survey and assess new concepts for next-generation GaSb-based thermophotovoltaic (TPV) devices, including liquid-phase epitaxial lateral overgrowth on patterned, masked substrates.
Proceedings ArticleDOI
Resonant cavity LEDs by lateral epitaxy
Michael G. Mauk,P. A. Burch,Scott W. Johnson,Zane A. Shellenbarger,James B. McNeely,Thomas A. Goodwin,Bryan W. Feyock +6 more
TL;DR: In this article, an AlGaAs optical cavity LED incorporating a refractory metal 'buried' mirror is assessed: a greater than 3-fold increase in output optical power is measured compared to control devices with no buried mirror.
SELECTIVE HETEROEPITAXY OF InGaP/GaAs/SILICON DEVICES FOR GENERATING HYDROGEN FROM SUNLIGHT
TL;DR: In this article, a mesaarray device structure is proposed that can be made by selective epitaxy of small-area (IO to 100 microns on a side) mesas should yield significant stress and defect reduction.