M
Midori Kawamura
Researcher at Kitami Institute of Technology
Publications - 138
Citations - 1989
Midori Kawamura is an academic researcher from Kitami Institute of Technology. The author has contributed to research in topics: Thin film & Sputtering. The author has an hindex of 21, co-authored 129 publications receiving 1729 citations. Previous affiliations of Midori Kawamura include Forschungszentrum Jülich.
Papers
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Optical and electrochromic properties of RF reactively sputtered WO3 films
TL;DR: In this paper, the effects of deposition conditions, including substrate temperature and sputtering gas pressure, on the optical and electrochromic properties of WO3 films prepared by RF reactive sputtering were investigated.
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Nanowires and Nanorings at the Atomic Level
TL;DR: The step-flow growth mode is used to fabricate Si and Ge nanowires with a width of 3.5 nm and a thickness of one atomic layer by self-assembly and alternating deposition of Ge and Si results in the formation of a nanowire superlattice covering the whole surface.
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Characterization of TiN films prepared by a conventional magnetron sputtering system: influence of nitrogen flow percentage and electrical properties
TL;DR: In this article, a radio-frequency magnetron sputtering system was used to produce reactive TiN films with high nitrogen flow and low resistivity at 400°C with 8% of nitrogen flow.
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Effects of Cu doping on nickel oxide thin film prepared by sol?gel solution process
TL;DR: In this article, the authors prepared nickel oxide (NiO) thin films with p-type Cu dopants using a sol-gel solution process and investigated their structural, optical, and electrical characteristics by X-ray diffraction (XRD), atomic force microscopy (AFM), optical transmittance and currentvoltage (I-V) characteristics.
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Rhodium and Rhodium Oxide Thin Films Characterized by XPS
TL;DR: In this paper, the XPS spectra of Rh 3d and O 1s core regions for these films were collected with a monochromatic Al Kα x-ray source.