Showing papers by "Mukul Gupta published in 2001"

TL;DR: In this article, thin films of iron nitrides were deposited by pulsed laser deposition at different nitrogen pressures, both in the presence and absence of glow-discharge around the substrate.

TL;DR: An amorphous iron nitride thin film was deposited using reactive ion beam sputtering of iron by a beam of argon and nitrogen ions in this article, and the mass density of the film was calculated using energy-dispersive X-ray reflectivity (EDXRR) measurements and was found to be 6.0 gm/cm 3.