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Myriam P. Sarachik

Researcher at City College of New York

Publications -  175
Citations -  6930

Myriam P. Sarachik is an academic researcher from City College of New York. The author has contributed to research in topics: Magnetic field & Magnetization. The author has an hindex of 31, co-authored 174 publications receiving 6746 citations. Previous affiliations of Myriam P. Sarachik include Bell Labs & Amherst College.

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Reflection symmetry at a B=0 metal-insulator transition in two dimensions

TL;DR: In this paper, a remarkable symmetry between the resistivity and conductivity on opposite sides of the B=0 metal-insulator transition in a two-dimensional electron gas in high-mobility silicon metal-oxide-semiconductor field effect transistors was reported.
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Magnetic properties of boron-doped silicon.

TL;DR: Results for both the susceptibility and magnetization indicate that exchange plays a more important role inSi:B than it does in Si:P, and the magnetic properties change gradually in this field and temperature range as the boron concentration is varied across the transition.
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Temperature dependence of the resistivity of a dilute two-dimensional electron system in high parallel magnetic field

TL;DR: In this paper, the resistance of silicon metal-oxide-semiconductor field effect transistors is measured as a function of temperature in high parallel magnetic fields where the two-dimensional system of electrons has been shown to be fully spin polarized.
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Magnetic-field-induced crossover from Mott variable-range hopping to weakly insulating behavior

TL;DR: A field-induced crossover at low temperatures to a resistivity that exhibits a weak power-law divergence, {rho}={rho}{sub 0}{ital T}{sup {minus}{alpha}}, with an exponent {alpha} that decreases slowly with increasing field.
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H/t scaling of the magnetoconductance near the conductor-insulator transition in two dimensions

TL;DR: For an electron density near the H=0 insulator-to-conductor transition, the magnetoconductivity of the low-temperature conducting phase in high-mobility silicon MOSFETs is consistent with the form {Delta{sigma}(H{sub {vert_bar}{vert-bar}},T{equivalent_to}{sigma},H{ sub {vert/vert/bar}],T{minus sigma} (0,T),T)=f(Hsub/vert /vert/Bar}/T)