N
Naoto Tsuji
Researcher at ASM International
Publications - 41
Citations - 1715
Naoto Tsuji is an academic researcher from ASM International. The author has contributed to research in topics: Dielectric & Inert gas. The author has an hindex of 17, co-authored 41 publications receiving 1703 citations.
Papers
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Temperature dependence of SiO2 film growth with plasma-enhanced atomic layer deposition
TL;DR: In this article, the growth per cycle (GPC) temperature dependence was investigated for SiO 2 films prepared by plasmaenhanced atomic layer deposition (PEALD) using bis-diethyl-amino-silane.
Patent
Method for increasing mechanical strength of dielectric film by using sequential combination of two types of uv irradiation
Kiyohiro Matsushita,Naoto Tsuji +1 more
TL;DR: In this article, a method for increasing the mechanical strength of a dielectric film was proposed, where the porogen was removed and the dielectrics were irradiated with a second UV light having a shorter wavelength than the first wavelength.
Patent
Method for forming Si-containing film using two precursors by ALD
TL;DR: A method for forming a silicon-containing dielectric film on a substrate by atomic layer deposition (ALD) includes: providing two precursors, one containing a halogen in its molecule, another precursor containing a silicon but no halogen, adsorbing a first precursor, which is one of the two pre-agents onto a substrate to deposit a monolayer of the first preagent, and exposing the second preagent to radicals of a reactant to cause surface reaction with the radicals as discussed by the authors.
Patent
UV-Curing Apparatus Provided With Wavelength-Tuned Excimer Lamp and Method of Processing Semiconductor Substrate Using Same
TL;DR: In this article, a UV irradiation apparatus for processing a semiconductor substrate is described, which consists of a UV lamp unit having at least one dielectric barrier discharge excimer lamp and a reaction chamber.
Patent
UV Irradiation Apparatus with Cleaning Mechanism and Method for Cleaning UV Irradiation Apparatus
Naoto Tsuji,Yasushi Fukasawa +1 more
TL;DR: In this article, a UV irradiation apparatus for processing a semiconductor substrate is described, which includes a UV lamp unit, a reaction chamber, a gas ring with nozzles serving as a first electrode, and an RF power source for supplying RF power to one or two electrodes.