P
Padmapani Nallan
Researcher at Applied Materials
Publications - 55
Citations - 1660
Padmapani Nallan is an academic researcher from Applied Materials. The author has contributed to research in topics: Etching (microfabrication) & Plasma etching. The author has an hindex of 24, co-authored 55 publications receiving 1660 citations.
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Patent
Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures
TL;DR: In this paper, a method for etching tungsten or tungststen nitride was proposed, which permits precise etch profile control while providing excellent selectivity, of at least 175:1, for example, in favor of etching a gate electrode rather than an adjacent oxide layer.
Patent
Method of etching tungsten or tungsten nitride in semiconductor structures
TL;DR: In this paper, a method for etching tungsten or tungstern nitride in semiconductor structures is presented. But the method is not suitable for the etch profile control and the etchant species are generated from a combination of sulfur hexafluoride and nitrogen (N 2 ).
Patent
Method for dicing a semiconductor wafer
TL;DR: In this paper, a method and apparatus for dicing a semiconductor wafer using a plasma etch process is described, which is based on applying a patterned mask to the integrated circuits on a wafer.
Patent
Method and apparatus for dicing a semiconductor wafer
TL;DR: In this paper, a method and apparatus for dicing a semiconductor wafer using a plasma etch process is described, which is based on applying a patterned mask to the integrated circuits on a wafer.
Patent
Method of patterning a layer of magnetic material
TL;DR: In this paper, a method of patterning a layer of magnetic material to form isolated magnetic regions is proposed, which forms a mask on a film stack comprising a layer, such the protected and unprotected regions are defined.