In accordance with the present invention, deposition of LiCoO2 layers in a pulsed-dc physical vapor deposition process is presented. Such a deposition can provide a low-temperature, high deposition rate deposition of a crystalline layer of LiCoO2 with a desired or orientation. Some embodiments of the deposition addresses the need for high rate deposition of LiCoO2 films, which can be utilized as the cathode layer in a solid state rechargeable Li battery. Embodiments of the process according to the present invention can eliminate the high temperature (>700°C) anneal step that is conventionally needed to crystallize the LiCoO2 layer. Some embodiments of the process can improve a battery utilizing the LiCoO2 layer by utilizing a rapid thermal anneal process with short ramp rates.

Deposition of licoo2

The present invention relates to apparatus, compositions and methods of fabricating high performance thin-film batteries on metallic substrates, polymeric substrates, or doped or undoped silicon substrates by fabricating an appropriate barrier layer composed, for example, of barrier sublayers between the substrate and the battery part of the present invention thereby separating these two parts chemically during the entire battery fabrication process as well as during any operation and storage of the electrochemical apparatus during its entire lifetime. In a preferred embodiment of the present invention thin-film batteries fabricated onto a thin, flexible stainless steel foil substrate using an appropriate barrier layer that is composed of barrier sublayers have uncompromised electrochemical performance compared to thin-film batteries fabricated onto ceramic substrates when using a 700° C. post-deposition anneal process for a LiCoO 2 positive cathode.

Electrochemical Apparatus With Barrier Layer Protected Substrate

An electrochemical device is claimed and disclosed wherein certain embodiments have a cathode greater than about 4 μm and less than about 200 μm thick; a thin electrolyte less than about 10 μm thick; and an anode less than about 30 μm thick. Another claimed and disclosed electrochemical device includes a cathode greater than about 0.5 μm and less than about 200 μm thick; a thin electrolyte less than about 10 μm thick; and an anode less than about 30 μm thick, wherein the cathode is fabricated by a non-vapor phase deposition method. The electrochemical device may also include a substrate, a current collector, an anode current collector, encapsulation and a moderating layer.

Hybrid thin-film battery

In accordance with the present invention, a dielectric barrier layer is presented. A barrier layer according to the present invention includes a densified amorphous dielectric layer deposited on a substrate by pulsed-DC, substrate biased physical vapor deposition, wherein the densified amorphous dielectric layer is a barrier layer. A method of forming a barrier layer according to the present inventions includes providing a substrate and depositing a highly densified, amorphous, dielectric material over the substrate in a pulsed-dc, biased, wide target physical vapor deposition process. Further, the process can include performing a soft-metal breath treatment on the substrate. Such barrier layers can be utilized as electrical layers, optical layers, immunological layers, or tribological layers.

Dielectric barrier layer films

A target material for deposition of rare-earth doped optical materials is described. The rare-earth ions, for example erbium and ytterbium, is prealloyed with host materials. In some embodiments a ceramic target material can be formed by pre-alloying Er 2 O 3 and/or Yb 2 O 3 with Al 2 O 3 and/or SiO 2 . In some embodiments, a metal target material can be formed by pre-alloying Er and/or Yb with Al and/or Si. In some embodiments, ceramic or metallic tiles are formed which can be mounted on a backing plate. In some embodiments, an intermetallic mixture can be formed and flame sprayed onto the backing plate.

Rare-earth pre-alloyed PVD targets for dielectric planar applications

An oriented film combination of (a) a base layer of polypropylene at least one surface of which comprises a maleic acid anhydride modified polypropylene; and (b) on at least one surface, a skin layer of an amorphous polyamide or a blend of an amorphous polyamide and a semicrystalline polyamide.

High barrier film

A metallized oriented film combination having a propylene polymer substrate with a high density polyethylene skin layer on at least one side thereof and a thin metal layer deposited on the surface of the high density polyethylene.

Robert Andrew Migliorini

Papers

High barrier film

Multilayer film with metallized surface