The invention relates to a vapour generator for the deposition of a metal coating onto a substrate (7), preferably a steel strip, that comprises a vacuum chamber (6) in the form of a housing including a vapour deposition head or ejector (3) in tight communication via a supply duct (4) with at least one crucible (1) containing the coating metal in a liquid form and located outside the vacuum chamber (6), characterised in that the ejector (3) includes a longitudinal slot for the vapour outlet acting as a sonic throat and extending on the entire width of the substrate (7), a filtration medium or a charge loss member (3A) made of a sintered material being provided in the ejector immediately before said slot on the vapour path in order to equalise the flow speed of the vapour exiting the ejector (3) through the sonic throat

Industrial vapour generator for the deposition of an alloy coating onto a metal strip

Provided is a continuous coating apparatus which can supply a liquid coating material (a molten metal) to a levitation-heating space through various paths, and can easily control a supply flow rate of the liquid coating material, and has a simplified structure. The continuous coating apparatus includes: a vacuum chamber unit through which a coating target passes; a levitation-heating unit disposed in the vacuum chamber unit and generating an evaporation vapor by vaporizing a supplied coating material; and a liquid coating material supply unit connected so that a liquid coating material is supplied to at least one of an upper portion and a lower portion of the levitation-heating unit, and communicating with the outside of the vacuum chamber unit.

Continuous coating apparatus

The present invention provides a vapour deposition process for the preparation of a chemical compound, wherein the process comprises providing each component element of the chemical compound as a vapour, and co-depositing the component element vapours on a common substrate, wherein: the vapour of at Ieast one component element is provided using a cracking source; the vapour of at least one other component element is provided using a plasma source; and at Ieast one further component element vapour is provided; wherein the component elements react on the substrate to form the chemical compound.

Vapour deposition process for the preparation of a chemical compound

PVD and HPHT methods and apparatus for producing materials, for example nitrides, are disclosed

Inorganic materials, methods and apparatus for making same, and uses thereof

Methods and apparatus for generating and delivering process gases for processing substrates are provided herein. In some embodiments, an apparatus for processing a substrate may include a container comprising a lid, a bottom, and a sidewall, wherein the lid, the bottom, and the sidewall define an open area; a solid precursor collection tray disposed within the open area; a gas delivery tube disposed within the open area and extending toward the solid precursor collection tray to provide a gas proximate the solid precursor collection tray; and a purge flow conduit coupled to the open area.

Methods and apparatus for generating and delivering a process gas for processing a substrate

A liquid metal evaporation source for use in Molecular Beam Epitaxy and related metal vacuum deposition techniques. An evaporator is maintained at a high temperature to evaporate a liquid metal, a reservoir for holding the liquid metal source is maintained at a temperature above the melting point of the metal but below the temperature in the evaporator, and a hollow transport tube connecting the evaporator and reservoir is maintained at a temperature between these temperatures. The reservoir is in the shape of a hollow cylinder with a close-fitting cylindrical piston which is used to force the liquid metal through the hollow transport tube into the evaporator. The liquid metal will not flow past the piston seal if a suitably small gap is formed between the piston and the reservoir walls wherein the surface tension of the liquid metal will exceed its hydrostatic pressure against the piston thus forming a leak-tight seal.

Roger J. Malik

Papers

Means and method for a liquid metal evaporation source with integral level sensor and external reservoir