S
Sakai Naomichi
Researcher at Sophia University
Publications - 6
Citations - 61
Sakai Naomichi is an academic researcher from Sophia University. The author has contributed to research in topics: Electrode & Thin film. The author has an hindex of 3, co-authored 6 publications receiving 60 citations.
Papers
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Journal ArticleDOI
Monomorph actuators using semiconductive ferroelectrics
Kenji Uchino,Mikihiko Yoshizaki,Kiyoshi Kasai,Hiroshi Yamamura,Sakai Naomichi,Hiroshi Asakura +5 more
TL;DR: In this paper, a bending actuator based on a single plate of semiconductive piezoelectric ceramics is proposed, where the principle of bending originates from the nonuniform distribution of the electric field caused by the semiconductor-metal electrode contact.
Journal ArticleDOI
New monolithic actuators, 'monomorphs', using semiconductive ferroelectrics.
Kenji Uchino,Mikihiko Yoshizaki,Kiyoshi Kasai,Hiroshi Yamamura,Sakai Naomichi,Hiroshi Asakura +5 more
TL;DR: In this paper, a single-plate actuator capable of bending equivalently to a bimorph was proposed using semiconductive ferroelectric ceramics, which is a simple structure named as a "monomorph" as compared with a multi-stacked type in the bimomorph.
Patent
Thin film capacitor and its manufacture
Sakai Naomichi,Yamamura Hiroshi +1 more
TL;DR: In this article, the capacitance of a thin film capacitor is improved by applying the solution of an organometallic compound of MgTiO3 which becomes dielectric to a conductive film after heat treatment, and heat-treating the applied solution.
Patent
Manufacture of ferro-electric thin film
TL;DR: In this paper, the authors proposed a method to control the grain size of a ferro-electric thin film by removing from a system of reaction, a reaction product quantity except for compounds which are produced by such compound reaction as in compound reaction mixed liquid of Pb, Ti, Zr components and organic substance.
Patent
Surface oxide type monomorph actuator and manufacture thereof
Sakai Naomichi,Yamamura Hiroshi +1 more
TL;DR: In this paper, the surface oxidation is executed by an electrolytic oxidizing method with mixture solution of sodium nitrite containing water-ethylene glycol as an electrolyte, and only the oxide phase of one side surface remains, the other side surface is ground until it becomes a semiconductor phase.