A body fluid is collected for testing for an analyte contained within the body fluid. The fluid is collected in an apparatus including a reservoir for receiving and collecting a flow of body fluid from a discharge end of a conduit. A capillary test space is in fluid flow communication with the reservoir. The capillary test space is positioned to be in contact with the fluid in the reservoir after the fluid has accumulated to a predetermined transfer volume of fluid. The capillary test space is sized to wick the fluid from the reservoir when the fluid contacts the capillary test space.

Collection well for body fluid tester

A method of producing a Fresnel zone plate (15) comprising: making available a substrate (1, 4, 7) which is rotationally symmetrical with respect to its center axis (1 a, 4 a, 7 a); applying layers (2 a-d; 5 a-d; 8 a-d ; 11) following in succession by means of an atomic layer deposition (ALD) method to faces (1 b-c; 4 b-c; 7 b-c) of the substrate (1, 4, 7) without rotation of the substrate (1, 4, 7) in order to form a coated substrate, and severing (3 a, b; 6 a, b; 9 a, b) at least one slice (13) from the coated substrate (1, 4, 7), by the coated substrate (1, 4, 7) being divided at least once at a right angle to the center axis (1 a, 4 a, 7 a).

Method and apparatus for producing a Fresnel zone plate

Two kinds of substances are deposited on the surface of a substrate with their thicknesses being gradually decreased according to a Fresnel pattern to form a deposited material The material is sliced in a direction parallel to the direction of deposition of the two kinds of substance The slice is fixed as an interference plate on the surface of a dispersing crystal in order to obtain an X-ray dispersing/focusing device The interference plate fixed on the surface of the dispersing crystal focuses photons by the Fresnel diffraction during the incidence and reflection of X-rays to and from the dispersing crystal, and acts as a dispersing/focusing device as a whole The dispersing crystal also acts as a base plate supporting the interference plate Since an interference plate with an outermost zone width of the Fresnel pattern of 1 nm or less is producible, the focusing of X-rays to small regions can be realized

X-ray dispersing/focusing device and method of producing same

The invention provides a preparation method of an X-ray zone plate. The preparation method of an X-ray zone plate includes the steps: preparing a support body with circular holes according to the thickness and diameter of a desired zone plate; preparing a mask plate on the support body, wherein the mask plate is a circular structure having a diameter slightly greater than the diameter of the eachcircular hole of the support body; performing spin coating by spin coating photoresist on two sides of the support body or in a glue spraying mode, and performing exposure development, wherein the photoresist at the circular hole parts of the support body is developed; alternately depositing a first film material and a second film material on the surface of the support body through an atomic layerdeposition technology to form a thin film girdle structure of the zone plate, wherein the thin film girdle structure is decreased layer by layer; etching the thin film material deposited on the edgeof the support body; cleaning the photoresist on the support body; and etching the redundant thin film material nearby the circular holes on the support body. The preparation method of an X-ray zone plate can obtain minimum outermost ring width by means of the atomic layer deposition technology, and the control precision can reach the nanometer level.

Preparation method of X-ray zone plate

The invention concerns to a method of producing a Fresnel Zone Plate (1 ) for applications in high energy radiation including the following steps: supply of a substrate (2) transparent for high energy radiation, deposition of a layer (3) of a metal, a metal alloy or a metal compound on a planar surface (4) of the substrate (2), calculating a three dimensional geometrical profile (5) with a mathematical model, setting up a dosage profile (6) for an ion beam of the ion beam lithography inverse to the calculated three dimensional geometrical profile (5) and milling a three dimensional geometrical profile (5) with concentric zones into the layer (3) with ion beam lithography by means of focused ion beam.

Method of producing a Fresnel Zone Plate for applications in high energy radiation

In a method of fabricating a fresnel zone plate, an end portion of a rod piece (29) is formed with a given diameter. Materials transparent and opaque with respect to an electromagnetic wave are alternately deposited on the rod piece (29) while the rod piece (29) is rotating, thereby to form a rod member with a multilayered structure. Each layer is uniform over the outer peripheral surface of the rod piece (29). The thickness of each layer is determined by design values of the fresnel zone plate. The rod member is inserted in a glass hollow cylinder and then the cylinder is filled with filling material. Then, the follow cylinder is sliced to form a slice piece (37). The slice piece is polished and fixed to a supporting ring (51), thereby to form a fresnel zone plate assembly (55). In the assembly 55, the slice piece (37) with a fresnel zone plate (3) supporting on a cylinder piece (53) formed by a hollow cylinder through filling material (54) is so arranged that the plate (3) is located at an opening of a through hole of the supporting ring (51), and the cylinder piece (53) is bonded to the supporting ring (51).

Method of fabricating a Fresnel zone plate

PURPOSE:To obtain a Fresnel zone plate having <=0.1mum image resolution, by coating alternately a light shielding member and a light producing member having a prescribed absorbing coefficient on the circumference surface of a rod- shaped matter and then cutting the rod-shaped matter at the face vertical to the axial core of the rod- shaped matter to obtain a flake. CONSTITUTION:A rod-shaped sample 29 having about 10mum.phi at the area measuring about 0.5mm. from the tip is attached to the rotary shaft of a rotary device 27, and a high degree of vacuum is secured within a container 20. Then the sample 29 is rotated in 300 rotational frequency while measuring the diameter through a microscope 35. Thus the sample 29 is etched to a desired diameter. Then the sample 29 is rotated in 100 rotational frequency, and at the same time Be is coated in 1.196mum by means of an vapor-deposition material source 23. Thereafter, Au is deposited in 0.918mum by the vapor-deposition material source 22. In such way, Be and Au are deposited alternately with a prescribed thickness up to 1,000 layers of coating, and Au is deposited in 0.0456mum at the 1,000th layer. Then the sample 29 is detached from the rotary shaft and buried into the center of a glass or metallic cylinder and cut into a disk shape including the vapor-deposited tip area. Then the single side of the disk is polished into a mirror surface and then adhered to a glass plate with an organic adhesive.

Shinozaki Toshiaki

Papers

Method of fabricating a Fresnel zone plate

Production of fresnel zone plate