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Stephen R. Gilbert

Researcher at Agilent Technologies

Publications -  37
Citations -  1466

Stephen R. Gilbert is an academic researcher from Agilent Technologies. The author has contributed to research in topics: Dielectric & Ferroelectric capacitor. The author has an hindex of 17, co-authored 37 publications receiving 1464 citations. Previous affiliations of Stephen R. Gilbert include Avago Technologies & Texas Instruments.

Papers
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Patent

Integrated circuit and method

TL;DR: A via etch to contact a capacitor with ferroelectric between electrodes together with dielectric on an insulating diffusion barrier includes two-step etch with Fbased dielectrics etch and Cl- and F-based barrier etch as discussed by the authors.
Patent

Hardmask designs for dry etching FeRAM capacitor stacks

TL;DR: In this paper, the authors describe a ferroelectric capacitor formed over a semiconductor substrate, the capacitance consisting of a bottom electrode, a top electrode, and a hard mask.
Patent

Method of enhancing adhesion of a conductive barrier layer to an underlying conductive plug and contact for ferroelectric applications

TL;DR: In this paper, the authors proposed a method of forming a conductive barrier layer on a dielectric layer, the method comprising the steps of: providing the dielectrics layer (112 of FIG 7 d ) having a top surface, a bottom surface, and an opening extending from the top surface to the bottom surface.
Patent

Acoustically communicating data signals across an electrical isolation barrier

TL;DR: In this article, a data communication system includes a modulator, an integrated acoustic data coupler, and a demodulator, where the modulator modulates a carrier signal having a frequency in an operating frequency range in response to an input data signal.
Patent

Methods of preventing reduction of irox during PZT formation by metalorganic chemical vapor deposition or other processing

TL;DR: In this paper, a method of fabricating a ferroelectric capacitor is described, which comprises the decreases a reduction in a bottom electrode material during formation of the Ferroelectric dielectric portion of the capacitor.