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Steve Riemer

Researcher at Seagate Technology

Publications -  29
Citations -  541

Steve Riemer is an academic researcher from Seagate Technology. The author has contributed to research in topics: Coercivity & Corrosion. The author has an hindex of 12, co-authored 29 publications receiving 491 citations.

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Composition, Structure, Stress, and Coercivity of Electrodeposited Soft Magnetic CoNiFe Films: Thickness and Substrate Dependence

TL;DR: In this article, the properties of soft magnetic CoNiFe films electrodeposited in the presence of saccharin and sodium lauryl sulfate additives were studied in terms of their thickness and substrate dependence.
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Effect of Magnetic Field on Electrode Reactions and Properties of Electrodeposited NiFe Films

TL;DR: In this article, a magnetic field of 0.1 T was applied parallel to the cathode to increase the current for solutions containing Ni +2, Fe +2 and H + ions.
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Mechanism of Saccharin Transformation to Metal Sulfides and Effect of Inclusions on Corrosion Susceptibility of Electroplated CoFe Magnetic Films

TL;DR: In this article, a mechanism for saccharin transformation to metal sulfides involves four steps: i a reductive cleavage of C-S bond in saccharins giving rise to benzamido sulfinate, ii a desulfurization step leading to benzamide and sulfur dioxide, iii an electrochemical reduction of sulfur dioxide to hydrogen sulfide, and iv a reaction between H2 Sa nd M +2
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Stress evolution in CoxFe1−x (x = 0.33–0.87) electrodeposited films

TL;DR: In this article, a sulfate/chloride plating solution containing saccharin as an organic additive at constant current density and a controlled pH 2.3 was used to study the relationship between increase of tensile stress and decrease of plating rate.
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Composition Gradients and Magnetic Properties of 5–100 nm Thin CoNiFe Films Obtained by Electrodeposition

TL;DR: In this article, the average elemental composition of CoNiFe, obtained by ICP analysis, changes during electrodeposition, and the extent of anomalous co-deposition achieved at deposit thickness 100 nm.