A major obstacle for the broad application of cathodic arc plasma deposition is the presence of micro- and nanoparticles in the plasma, also often referred to as 'macroparticles'. This paper reviews the formation of macroparticles at cathode spots, their interaction with the arc plasma and substrate, and macroparticle separation and removal from the plasma by various filtering methods. Nineteen variants of filters are discussed, including Aksenov's classic 90{sup o}-duct filter, filters of open architecture, and the concept of stroboscopic filtering.

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Approaches to rid cathodic arc plasmas of macro-and nanoparticles : a review

An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma source, has at least one deflecting electrode mounted on one or more walls of the plasma duct. In one embodiment an isolated repelling or repelling electrode is positioned in the plasma duct downstream of the deflecting electrode where the tangential component of a deflecting magnetic field is strongest, connected to the positive pole of a current source which allows the isolated electrode current to be varied independently and increased above the level of the anode current. The deflecting electrode may serve as a getter pump to improve pumping efficiency and divert metal ions from the plasma flow. In a further embodiment a second arc source is activated to coat the substrates while a first arc source is activated, and the magnetic deflecting system for the first arc source is deactivated to confine plasma to the cathode chamber but permit electrons to flow into the coating chamber for plasma immersed treatment of the substrates. A load lock shutter may be provided between the plasma duct and the coating chamber further confine the plasma from the first arc source.

Filtered cathodic arc deposition method and apparatus

A system for the measurement, analysis, removal, addition or imaging of material uses nanostructures in conjunction with mechanical, electromagnetic (optical) and electrical means. Such nanostructures and techniques are combined in a system that can modify bulk or large area objects such as silicone waffers and masks for lithography. An SPM system (100) for making modifications to an object (102) comprises an SPM probe for making the modifications to the object, a positioning system (103) for positioning the SPM probe with respect to the object, and a controller for controlling the positioning system such that the modifications of the object are made with the SPM probe particulate matter is removed from the object by the modifications, and the SPM probe makes sweeping motions over the object to sweep away the removed particulate material.g these elements in a system which can modify bulk or large area objects such as silicon wafers, and masks for lithography.

Object inspection and/or modification system and method

Methods and apparatus for generating uniformly-distributed plasma are described. A plasma generator according to the invention includes a cathode assembly (204) that is positioned adjacent to an anode (216) and forming a gap (220) there between. A gas source (228) supplies a volume of feed gas and/or a volume of excited atoms to the gap between the cathode assembly and the anode. A power supply (202) generates an electric field across the gap between the cathode assembly and the anode. The electric field ionizes the volume of feed gas and/or the volume of excited atoms that is supplied to the gap, thereby creating a plasma in the gap.

Generation of uniformly-distributed plasma

An overview of the current state of vacuum-arc-based coating technology is presented, with particular emphasis on defining those areas where further investigation would reap the greatest benefits. Particular attention is given to the 'continuous' cathodic arc, which is currently the best understood approach and which has been most successfully adapted for large-scale commercial coating in the United States. It is noted that the greatest promise of ion-based coating technology based on the vacuum arc is the potential for increased control over the coating process. Unlike the case for neutral coating atoms, the presence of a charge on coating ions gives a 'handle' to exert forces on them using electrostatic fields. One can in theory control the trajectory of these ions between the coating source and part to be coated. One can also control the energy with which they impact the substrate. It may even be possible to control the extent of their reactivity. >

Coating technology based on the vacuum arc-a review

A method and apparatus for vacuum arc deposition of material on a surface of an object (32), uses a vacuum chamber (12) accomodating the active surface of the cathode (24) and an anode (34). A power supply connected to the anode (34) and cathode (24) establishes an electric arc. The track of the arc is controlled with a magnetic field established with a permanent magnet (56) that is moved in a closed path relative to the cathode. A solenoid (68) modifies the main magnetic field produced on the active surface of the cathode (24).

Controlled vacuum arc material deposition, method and apparatus

A process and apparatus for controlled arc coating of substrates utilizing relatively thick cathodes or targets for obtaining coatings which are free of macro-particles. The thick targets are capable of use by controlling and steering the arc in a desired path as necessary to produce coatings of the desired compositions using magnetic fields generated to provide arc path control and modulation for efficient cathode utilization.

Steered arc coating with thick targets

An acoustic emission sensor comprising a piezoelectric material that is integral with a tooling or machine element in which acoustic emissions are to be sensed.

Integral acoustic emission sensor for manufacturing processes and mechanical components

A process for arc coating alloy nitride films on objects using a cathode or target (24) composed of separate sections (25, 26) of the two metals from which the alloy is to be formed and a steered arc that is controlled in its path across the target (24) along a controlled arc trajectory to provide a controlled coating composition with reproducible results.

Arc coating of refractory metal compounds

A high speed steel, carbide or ceramic cutting insert or tool carrying an integrally mounted sensor to permit the sensor to sense and monitor machining phenomena on the cutting insert on a continuous basis to determine whether the cutting insert is operating efficiently and effectively.

Subbiah Ramalingam

Papers

Controlled vacuum arc material deposition, method and apparatus

Steered arc coating with thick targets

Integral acoustic emission sensor for manufacturing processes and mechanical components

Arc coating of refractory metal compounds

Intelligent insert with integral sensor