T
T. G. Blocker
Publications - 1
Citations - 3
T. G. Blocker is an academic researcher. The author has contributed to research in topics: Photolithography & Next-generation lithography. The author has an hindex of 1, co-authored 1 publications receiving 3 citations.
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Two‐phase high‐density charge coupled devices fabricated by electron‐beam lithography
TL;DR: One hundred and twentyeight-bit, two-phase, high-density CCD linear shift registers with double-level polysilicon overlapping gate electrodes have been fabricated using electron-beam lithography for all levels of pattern delineation as discussed by the authors.