T
T.S. Sathiaraj
Researcher at Botswana International University of Science and Technology
Publications - 34
Citations - 964
T.S. Sathiaraj is an academic researcher from Botswana International University of Science and Technology. The author has contributed to research in topics: Thin film & Band gap. The author has an hindex of 14, co-authored 34 publications receiving 785 citations. Previous affiliations of T.S. Sathiaraj include Carnegie Learning & University of Botswana.
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Effect of doping concentration on the properties of aluminium doped zinc oxide thin films prepared by spray pyrolysis for transparent electrode applications
TL;DR: In this article, transparent conducting aluminium doped zinc oxide (ZnO:Al ) thin films were deposited on float glass substrates by tailor made spray pyrolysis with adaptation for measuring the actual temperature of the substrate surface during deposition.
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Synthesis and characterization of zinc oxide thin films for optoelectronic applications
TL;DR: Micro-ring structured zinc oxide (ZnO) thin films were prepared on glass substrates by spray pyrolysis and their structural, morphological, optical and electrical properties were investigated, indicating their suitability in optoelectronic applications.
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Effect of gallium doping on the structural, optical and electrical properties of zinc oxide thin films prepared by spray pyrolysis
TL;DR: In this article, the effect of gallium doping on zinc oxide thin films was investigated by X-ray Diffraction, Spectrophotometry and Current-Voltage (I-V) measurements, respectively.
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Effect of annealing on the structural, optical and electrical properties of ITO films by RF sputtering under low vacuum level
TL;DR: It has been found from the electrical measurement that films sputtered at 200W power and subsequently annealed at 400^oC have a sheet resistance of 80@W/@?
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Structural, optical and electrical properties of low temperature grown undoped and (Al, Ga) co-doped ZnO thin films by spray pyrolysis
TL;DR: In this paper, aluminum and gallium co-doped ZnO thin films were grown by simple, flexible and cost-effective spray pyrolysis method on glass substrates at a temperature of 230°C.