T
Taeho Shin
Researcher at Applied Materials
Publications - 3
Citations - 103
Taeho Shin is an academic researcher from Applied Materials. The author has contributed to research in topics: Etching (microfabrication) & Plasma etching. The author has an hindex of 2, co-authored 3 publications receiving 103 citations.
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Patent
Method of controlling silicon-containing polymer build up during etching by using a periodic cleaning step
TL;DR: In this article, a method of removing a silicon-containing hard polymeric material from an opening leading to a recessed feature during the plasma etching of said recessed features into a carbon-containing layer in a semiconductor substrate is described.
Patent
Method of controlling sidewall profile by using intermittent, periodic introduction of cleaning species into the main plasma etching species
TL;DR: In this paper, a method of removing a silicon-containing hard polymeric material from an opening leading to a recessed feature during the plasma etching of said recessed features into a carbon-containing layer in a semiconductor substrate is described.
Patent
Stabilizing an opened carbon hardmask
TL;DR: In this article, a carbon-based hard mask is photo lithographically etched, and it is exposed to a plasma of a hydrogen-containing reducing gas, and a fluorocarbon gas, preferably trifluoromethane.