A transparent conductor including a conductive layer coated on a substrate is described. More specifically, the conductive layer comprises a network of nanowires that may be embedded in a matrix. The conductive layer is optically clear, patternable and is suitable as a transparent electrode in visual display devices such as touch screens, liquid crystal displays, plasma display panels and the like.

Nanowire-based transparent conductors and applications thereof

A Transparent conductor including a conductive layer coated on a substrate is described. More specifically, the conductive layer comprises a network of nanowires which may be embedded in a matrix. The conductive layer is optically transparent and flexible. It can be coated or laminated onto a variety of substrates, including flexible and rigid substrates.

Nanowired-based transparent conductors

In a state that a plate-shaped insulator is disposed adjacent to a plate-shaped electrode, a discharge gas containing an inert gas is supplied to a vicinity of a processing object from one gas exhaust port located nearer from the plate-shaped electrode, out of at least two-line gas exhaust ports which are disposed around the plate-shaped electrode and which are formed so as to be surrounded by the plate-shaped insulator and moreover which are different in distance to the plate-shaped electrode from each other, while a discharge control gas is supplied from the other gas exhaust port to the vicinity of the processing object. Simultaneously with the supply of the gases, electric power is supplied to the plate-shaped electrode or the processing object, by which plasma processing of the processing object is carried out. Thus, plasma processing method and apparatus capable of processing for desired fine linear portions with high precision are provided.

Plasma processing method and apparatus

Composite transparent conductors are described, which comprise a primary conductive medium based on metal nanowires and a secondary conductive medium based on a continuous conductive film.

Composite transparent conductors and methods of forming the same

An optical film, which is an optically compensatory film that comprises: at least two optically anisotropic layers comprising a first optically anisotropic layer and a second optically anisotropic layer, wherein the first optically anisotropic layer is formed by mixing two or more liquid crystal compounds having different structures with each other.

Optical film, polarizing plate, and liquid crystal display device

A method for forming a thin film wherein two kinds of opposited electrodes are supplied with a power of 1W/cm2 of more at a high-frequency voltage exceeding 100 kHz under a pressure equal or approximate to the atmospheric pressure, a discharge is caused, a reactive gas is changed to a plasm, substrate is exposed to the plasma, and thereby a thin film is formed over the substrate.

Method for forming thin film, article having thin film, optical film, dielectric coated electrode, and plasma discharge processor

A method for forming an anti-glare layer, including the step of; ejecting dropletts of an ink with an ink-jet apparatus onto a transparent substrate so as to form a microscopically roughened structure on the transparent substrate, wherein the ink contains an ingredient capable of giving an anti-glare property to the transparent substrate.

Method for forming anti-glare layer and anti-glare film, and ink-jet apparatus for forming anti-glare layer

PROBLEM TO BE SOLVED: To firstly provide an optical film which is hardly damaged by an antireflection layer and antidazzle layer and is simplified in a pretreatment for bonding, to secondly provide the optical film having decreased defects and to thirdly provide the optical film having excellent properties. SOLUTION: 1) The optical film having at least the anitdazzle layer or antireflection layer on either one side of a base material and having an easily adhesive layer on the opposite side of the base material. 2) The optical film of which the antireflection layer is an optical interference layer. 3) The optical film as stated in 1 of which the reflectivity of the specular reflection of so at any wavelength of visible light is <=2%.

Optical film and method for manufacturing the same

A method of forming a layer or layers are disclosed which comprises the steps of transporting a substrate having a first surface and a second surface on the side opposite the first surface to a gap formed between a first electrode and a second electrode opposing each other, the second surface having a coefficient of kinetic friction of not more than 0.9; and subjecting the first surface of the substrate to plasma discharge treatment to form the layer at atmospheric pressure or at approximately atmospheric pressure while supplying a reactive gas to the gap.

Thin film forming method, optical film, polarizing film and image display method

A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.

Takashi Murakami

Papers

Method for forming thin film, article having thin film, optical film, dielectric coated electrode, and plasma discharge processor

Method for forming anti-glare layer and anti-glare film, and ink-jet apparatus for forming anti-glare layer

Optical film and method for manufacturing the same

Thin film forming method, optical film, polarizing film and image display method

Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus