T
Tamihiro Miyoshi
Researcher at Asahi Kasei
Publications - 18
Citations - 40
Tamihiro Miyoshi is an academic researcher from Asahi Kasei. The author has contributed to research in topics: Signal & Luminous flux. The author has an hindex of 3, co-authored 18 publications receiving 40 citations.
Papers
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Patent
Apparatus for correcting scanning beams on basis of tilting of surface segments of polygonal mirror used in scanning pattern drawing apparatus
Hiroaki Andoh,Michio Ohshima,Yuji Matsui,Takashi Okuyama,Toshitaka Yoshimura,Hidetaka Yamaguchi,Yasushi Ikeda,Jun Nonaka,Tamihiro Miyoshi,Mitsuo Kakimoto,Masatoshi Iwama,Hideyuki Morita,Satoru Tachihara,Akira Morimoto,Akira Ohwaki +14 more
TL;DR: In this article, an apparatus for correcting a scranning beam produced by a polygonal mirror tilting in small surface segments in each mirror surface segment caused by uneven mirror surfaces is presented.
Patent
Monitor mechanism for use with a scanning optical apparatus with composite drawing a monitoring beams
Hiroaki Andoh,Michio Ohshima,Yuji Matsui,Takashi Okuyama,Toshitaka Yoshimura,Hidetaka Yamaguchi,Yasushi Ikeda,Jun Nonaka,Tamihiro Miyoshi,Mitsuo Kakimoto,Masatoshi Iwama,Hideyuki Morita,Satoru Tachihara,Akira Morimoto,Akira Ohwaki +14 more
TL;DR: In this article, a monitor mechanism for use with a scanning optical apparatus in which the direction of polarization is utilized to separate a source laser light beam into a pattern drawing and a monitor beamlet and synthesize them again into a single after passing through a scanning lens and beam deflector is presented.
Patent
Method of making an aperture plate for a multibeam pattern drawing apparatus
Satoru Tachihara,Koichi Maruyama,Nakamura Tetsuya,Takashi Okuyama,Tamihiro Miyoshi,Shinichi Suzuki +5 more
TL;DR: In this paper, a corrected aperture plate is used to correct the locational errors of the dot images in the normal direction when the corrected aperture is used, and the image of the pattern is recorded at the position of the aperture plate and used as a guide to form corrected apertures.
Patent
Drawing surface regulating mechanism in scan-type drawing device
Hiroaki Andoh,Michio Ohshima,Yuji Matsui,Takashi Okuyama,Toshitaka Yoshimura,Hidetaka Yamaguchi,Yasushi Ikeda,Jun Nonaka,Tamihiro Miyoshi,Mitsuo Kakimoto,Masatoshi Iwama,Hideyuki Morita,Satoru Tachihara,Morimoto Rei,Akira Ohwaki +14 more
TL;DR: In this article, a drawing board part in a drawing surface mechanism of a scan-type drawing device was allowed to be inclined as well as being moved vertically to enable the drawing surface to be contained within a depth of focus of a scanning lens even if undulation or the like exists on the drawing surfaces in the range of one scanning.
Patent
Drawing surface adjusting mechanism for scanning pattern drawing apparatus
Hiroaki Andoh,Michio Ohshima,Yuji Matsui,Takashi Okuyama,Toshitaka Yoshimura,Hidetaka Yamaguchi,Yasushi Ikeda,Jun Nonaka,Tamihiro Miyoshi,Mitsuo Kakimoto,Masatoshi Iwama,Hideyuki Morita,Satoru Tachihara,Akira Morimoto,Akira Ohwaki +14 more
TL;DR: In this article, a drawing surface adjusting mechanism was proposed for large scanning pattern drawing apparatus in which a scanning optical system scans drawing rays of light along scanning lines on a workpiece on a drawing board.