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Tokihiro Nishihara

Publications -  2
Citations -  694

Tokihiro Nishihara is an academic researcher. The author has contributed to research in topics: Epitaxy & Thin film. The author has an hindex of 2, co-authored 2 publications receiving 669 citations.

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Control of preferred orientation for ZnOx films: control of self-texture

TL;DR: In this article, the preferred orientation of ZnOx films was controlled by radio frequency (RF) magnetron sputtering, and the growth mechanisms were made clear with respect to the density of surface energy.
Journal ArticleDOI

Heteroepitaxy of zinc oxide thin films, considering non-epitaxial preferential orientation

TL;DR: In this paper, the authors investigated whether there is a condition which changes the preferential orientation on single crystal substrates (epitaxial growth) and how to obtain excellent epitaxial ZnO films when the preferential orientations are not the same as the epitaxially one.