T
Toshiaki Ishimaru
Researcher at Hitachi
Publications - 42
Citations - 296
Toshiaki Ishimaru is an academic researcher from Hitachi. The author has contributed to research in topics: Layer (electronics) & Alkyl. The author has an hindex of 9, co-authored 42 publications receiving 295 citations.
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Patent
Process for producing printed circuit board
Kanji Murakami,Mineo Kawamoto,Akio Tadokoro,Haruo Akahoshi,Toshikazu Narahara,Ritsuji Toba,Toshiaki Ishimaru,Nobuyuki Hayashi,Motoyo Wajima +8 more
TL;DR: In this article, a process for producing a printed circuit board, which comprises the steps of forming a layer comprising a photosensitive resin composition on an insulating substrate having on its surface an adhesive layer adherent to a metal being subsequently plated thereon, is described.
Patent
Process for producing adhesive film
TL;DR: In this article, a process for producing adhesive film comprising coating on a film-like substrate a composition comprising (i) a copolymer having a glass transition temperature of -30° C. or lower and obtained from one or more monomers (a) such as alkyl acrylates or methacryls, or the like, and another monomers containing at least one carboxyl, alcoholic hydroxyl, or glycidyl group, a crosslinking agent having at least two crosslinkable functional groups which can react with the monomers, and
Patent
Photosensitive resin compositions
TL;DR: In this paper, a photo-polymerizable unsaturated compound having at least two terminal ethylene groups, a reactive linear high molecular weight compound having in its side chain one or two functional groups selected from the class consisting of tetrahydrofurfuryl group and N-alkoxymethylcarbamoyl group, a sensitizer capable of initiating polymerization of the above unsaturated compounds upon irradiation with active rays, and a compound having two epoxy groups, and (E) a potential or latent curing agent for epoxy resins.
Proceedings ArticleDOI
Fine line circuit manufacturing technology with electroless copper plating
Haruo Akahoshi,Mineo Kawamoto,Toshiaki Itabashi,Osamu Miura,Akio Takahashi,Shiro Kobayashi,Miyazaki Masashi,T. Mutho,Motoyo Wajima,Toshiaki Ishimaru +9 more
TL;DR: In this paper, two types of additive processes for fine circuit pattern manufacturing technology using electroless copper plating have been developed, which offer high dimensional accuracy and high accuracy in terms of circuit performance.
Patent
Image producing method
TL;DR: In this paper, a specified photosensitive adduct with active rays of light is formed on a base with a photosensitive resin compsn. contg. The photosensitive layer is imagewise exposed with active ray of light and developed with an aq. alkali soln.