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V. Vavru

Publications -  1
Citations -  38

V. Vavru is an academic researcher. The author has contributed to research in topics: Thin film & Crystallization. The author has an hindex of 1, co-authored 1 publications receiving 28 citations.

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EMRS Symp B Proceedings Formation of thin-film crystalline silicon on glass observed by in- situ XRD

V. Vavru, +1 more
TL;DR: In this article, a-Si:H films with different hydrogen contents were annealed using temperatures ranging from 500°C to 700°C. Expanding thermal plasma chemical vapor deposition (ETP-CVD) was used to prepare hydrogenated aSi films; this technique was chosen because the deposition rates are much higher than with plasma enhanced CVD.