W
Wan-Jae Myeong
Researcher at LG Chem
Publications - 4
Citations - 66
Wan-Jae Myeong is an academic researcher from LG Chem. The author has contributed to research in topics: Composite number & Shallow trench isolation. The author has an hindex of 4, co-authored 4 publications receiving 66 citations.
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Patent
Lithium-metal composite oxides and electrochemical device using the same
Sung Kyun Chang,Eui-Yong Bang,Minchul Jang,Sanghoon Choy,Ki-Young Lee,Saebomi Park,Wan-Jae Myeong,Kyu-Ho Song,Joo-Hyeong Lee,Young-Sik Hahn,Myung-Ho Cho +10 more
TL;DR: In this article, a lithium-containing metal composite oxide comprising paramagnetic and diamagnetic metals, which satisfies any one of the following conditions: (a) the ratio of intensity between a main peak of 0 ± 10 ppm (IoPPm) and a primary peak of 240 ± 140 ppm(I240pPm), Uoppm / l24oPPM), is less than 0.117 • Z, wherein Z is the ratio ratio of moles of the diamagnetic metal tomoles of lithium, and (b) the line width between the main
Patent
Coating method of metal oxide superfine particles on the surface of metal oxide and coating produced therefrom
TL;DR: In this paper, a method of coating the surface of metal oxide with ultrafine metal oxide particles and a coating produced thereby is described, which includes bringing metal (ml) oxide into contact with an aqueous solution of a metal (M2) salt to be applied thereon, and continuously mixing and reacting the contacted metal oxide at a reaction temperature of 200~700°C under pressure of 180~550 bar.
Patent
Manufacturing methods of fine cerium oxide particles and its slurry for shallow trench isolation process of semiconductor
Ho-Seong Nam,Gui-Ryong Ahn,Jin-Seo Lee,Man-Woo Jung,Soon-Young Soh,Joo-Hyeong Lee,Young-Sik Hahn,Wan-Jae Myeong +7 more
TL;DR: In this paper, the authors used fine cerium oxide particles and its slurry for shallow trench isolation process of semiconductor to increase the removal selectivity, an aqueous solution of additives consists of polyacrylic acid and amine compounds is added the cerium dioxide slurry.
Patent
Concentrate of fine ceria particles for chemical mechanical polishing and preparing method thereof
TL;DR: In this article, a concentrate of fine ceria particles for chemical mechanical polishing is presented, and a method of preparing the same is described. But the method is limited to a single filter with a pore size of 0.01 to 10 µm.