W
Wolfram A. Bosenberg
Researcher at RCA Corporation
Publications - 4
Citations - 125
Wolfram A. Bosenberg is an academic researcher from RCA Corporation. The author has contributed to research in topics: Diffraction & Phase-shift mask. The author has an hindex of 4, co-authored 4 publications receiving 125 citations.
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Patent
Optically testing the lateral dimensions of a pattern
TL;DR: In this article, a method of optically testing the lateral dimensions of a pattern of material disposed on a substrate comprises applying the material to both the main area of the substrate and a test area on the same substrate, and selectively removing the material from both areas on the substrate simultaneously to form respectively the pattern on the main surface and a diffraction grating on the test surface.
Patent
Photomask alignment system
TL;DR: An automatic photomask alignment system as discussed by the authors includes a monochromatic light source such as a laser, a series of diffraction patterns which are located on a semiconductor substrate and keys located on photomasks with which the substrate is to be aligned.
Patent
Method of defining a photoresist layer
TL;DR: In this article, the authors proposed vibrating the wafer during the exposure of the photoresist in order to eliminate standing waves which occur in layers parallel to the surface of the polygonal layer and which cause alternately exposed and unexposed layers to be present.